Positive displacement pumping chamber
View Patent ↗A method is for processing a substrate. The method includes placing the substrate in a process volume and introducing a process gas or vapor into the process volume and/or subsequently removing gas or vapor from the volume. The step of introducing and/or removing the gas is at least partially performed by moving a movable wall to change the process volume in an appropriate sense.
1. A method of processing a substrate comprising:
placing the substrate in a process space delimited by a movable wall;
introducing a process gas or vapour into the process space;
carrying out a process on the substrate in the process space using the process gas or vapor; and
removing gas or vapour from the process space, and
wherein at least one of the introducing and the step of removing of the gas or vapour is effected at least in part by moving the movable wall to change the volume of the process space and thereby draw the process gas or vapour into the process chamber or expel gas or vapour from the process chamber,
wherein the process gas or vapor is introduced into the process space a number of discrete times,
gas or vapour is removed from the process space a number of discrete times each occurring after the process gas or vapour has been introduced into the process chamber,
whereby the introducing and removing of the gas or vapour are sequentially repeated, and
the introducing of the process gas or vapour and the removing of the gas or vapor are effected at least in part by moving the movable wall to sequentially and repeatedly increase and decrease the volume of the process space.
2. A method as claimed in claim 1 wherein the process is chemical vapour deposition.
3. A method as claimed in claim 1 wherein the process is atomic layer deposition.
4. A method as claimed in claim 1 wherein the process is dry etching.