IP Library Granted Patent US 8,807,184
Granted Patent B2
US 8,807,184 · App. 13/774,136 · Granted Aug 19, 2014

Reduction of edge chipping during wafer handling

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,807,184
App. No.
13/774,136
Granted
Aug 19, 2014
Kind
B2
Abstract

Methods and systems for reinforcing the periphery of a semiconductor wafer bonded to a carrier are disclosed. In one embodiment, additional adhesive is applied to the semiconductor wafer prior to bonding. The additional adhesive seeps into a crevice between the carrier and wafer and provides reinforcement. In another embodiment, adhesive is applied to the crevice by a dispenser after the wafer is bonded to the glass carrier.

Claims (9)

1. A method for reducing edge chipping of a semiconductor wafer, comprising:

dispensing adhesive in a center zone on a top surface of the semiconductor wafer;

disposing a glass carrier onto the top surface of the semiconductor wafer, thereby forming a glass-wafer structure comprising a crevice between the glass carrier and the semiconductor wafer;

applying a fill material in the crevice by dispensing adhesive along an outermost edge of the semiconductor wafer and parallel to the crevice with a brush dispenser; and

wherein disposing a glass carrier onto the top surface of the semiconductor wafer comprises applying a compressive force on the glass carrier and semiconductor wafer in the range of 6 to 95 kilo-Newtons.

2. The method of claim 1 , wherein the compressive force is applied in an environment having a temperature in the range of about 110 to about 390 degrees Celsius.

3. The method of claim 2 , wherein the compressive force is applied for a time period ranging from 10 to 600 seconds.

4. The method of claim 1 , wherein applying a fill material in the crevice comprises applying a polyimide adhesive.

5. The method of claim 1 , further comprising grinding the semiconductor wafer to a thickness in the range of about 32 to about 495 micrometers.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 4, 2020
From: INTERNATIONAL BUSINESS MACHINES CORPORATION
To: ELPIS TECHNOLOGIES INC.
Reel/Frame 052561/0161 →