IP Library Patent Application 13775279
Patent Application
App. No. 13/775,279

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

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Quick Facts
Patent No.
US None
App. No.
13/775,279
Abstract

In a semiconductor device, a first semiconductor element having a first terminal is embedded in a resin layer such that terminals thereof are exposed through a first surface of the resin layer. A wiring layer is formed in the first surface of the resin layer. A second semiconductor element includes second and third terminals. Regardless of the relationship between the plane size of the first semiconductor element and that of the second semiconductor element, the second terminal of the second semiconductor element is connected to the first terminal of the first semiconductor element exposed through the first surface of the resin layer, and the third terminal of the second semiconductor element is connected to the wiring layer formed in the resin layer.

Claims (19)

1 .- 8 . (canceled)

9 . A method of manufacturing a semiconductor device comprising:

forming a wiring layer in a first area of a supporter;

placing a first semiconductor element including a first terminal on a second area of the supporter;

forming a resin layer on the supporter and covering the wiring layer and the first semiconductor element;

removing the supporter and exposing the first terminal and the wiring layer from a first surface of the resin layer; and

mounting a second semiconductor element including a second terminal and a third terminal on the first surface of the resin layer such that the second terminal is connected to the first terminal and such that the third terminal is connected to the wiring layer after removing the supporter.

10 . A method of manufacturing a semiconductor device comprising:

forming a wiring layer in a first area of a supporter;

placing a first semiconductor element including a first terminal and a second semiconductor element including a second terminal on a second area of the supporter;

forming a resin layer on the supporter and covering the wiring layer, the first semiconductor element and the second semiconductor element;

removing the supporter and exposing the first terminal, the wiring layer and the second terminal from a first surface of the resin layer; and

mounting a third semiconductor element including a third terminal, a fourth terminal and a fifth terminal on the first surface of the resin layer such that the third terminal is connected to the wiring layer, the fourth terminal is connected to the first terminal and the fifth terminal is connected to the second terminal after removing the supporter.

11 . A method of manufacturing a semiconductor device comprising:

forming a first wiring layer and a second wiring layer in a first area of a supporter;

placing a first semiconductor element including a first terminal and a second terminal on a second area of the supporter;

forming a resin layer on the supporter and covering the first wiring layer, the second wiring layer and the first semiconductor element;

removing the supporter and exposing the first wiring layer, the second wiring layer, the first terminal and the second terminal from a first surface of the resin layer;

mounting a second semiconductor element including a third terminal and a fourth terminal and a third semiconductor element including a fifth terminal and a sixth terminal on the first surface such that the third terminal is connected to the first wiring layer, the fourth terminal is connected to the first terminal, the fifth terminal is connected to the second wiring layer and the sixth terminal is connected to the second terminal after removing the supporter.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 17, 2015
From: FUJITSU SEMICONDUCTOR LIMITED
To: SOCIONEXT INC.
Reel/Frame 035453/0904 →