IP Library Patent Application 13781080
Patent Application
App. No. 13/781,080

Group III-V and Group IV Composite Diode

Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US None
App. No.
13/781,080
Abstract

In one implementation, a group III-V and group IV composite diode includes a group IV diode in a lower active die, the group IV diode having an anode situated on a bottom side of the lower active die. The group III-V and group IV composite diode also includes a group III-V transistor in an upper active die stacked over the lower active die, the group III-V transistor having a drain, a source, and a gate situated on a top side of the upper active die. The source of the group III-V transistor is electrically coupled to a cathode of the group IV diode using a through-semiconductor via (TSV) of the upper active die.

Claims (25)

1 . A composite diode comprising:

a group IV diode in a lower active die, an anode of said group IV diode being situated on a bottom side of said lower active die;

a group III-V transistor in an upper active die stacked over said lower active die, a drain, a source, and a gate of said group III-V transistor being situated on a top side of said upper active die;

said source of said group III-V transistor being electrically coupled to a cathode of said group IV diode using a through-semiconductor via (TSV) of said upper active die.

2 . The composite diode of claim 1 , wherein said cathode of said group IV diode is situated on a top side of said lower active die.

3 . The composite diode of claim 1 , wherein said TSV does not reach a bottom side of said upper active die.

4 . The composite diode of claim 1 , wherein said TSV reaches a highly conductive substrate in said upper active die, said highly conductive substrate being in electrical contact with said cathode of said group IV diode.

5 . The composite diode of claim 1 , wherein said TSV reaches a bottom side of said upper active die.

6 . The composite diode of claim 1 , wherein said group III-V transistor is a normally ON transistor.

7 . The composite diode of claim 1 , wherein said group III-V transistor is a high-voltage (HV) transistor and said group IV diode is a low-voltage (LV) diode.

8 . The composite diode of claim 1 , wherein said group III-V transistor is a III-Nitride high electron mobility transistor (III-Nitride HEMT).

9 . The composite diode of claim 1 , wherein said group III-V transistor comprises gallium nitride (GaN).

10 . The composite diode of claim 1 , wherein said group IV diode comprises silicon.

11 . A III-Nitride-silicon composite diode comprising:

a silicon diode in a lower active die, an anode of said silicon diode being situated on a bottom side of said lower active die;

a III-Nitride transistor in an upper active die stacked over said lower active die, a drain, a source, and a gate of said III-Nitride transistor being situated on a top side of said upper active die;

said source of said III-Nitride transistor being electrically coupled to a cathode of said silicon diode using a through-semiconductor via (TSV) of said upper active die.

12 . The III-Nitride-silicon composite diode of claim 11 , wherein said cathode of said silicon diode is situated on a top side of said lower active die.

13 . The III-Nitride-silicon composite diode of claim 11 , wherein said TSV does not reach a bottom side of said upper active die.

14 . The III-Nitride-silicon composite diode of claim 11 , wherein said TSV reaches a highly conductive substrate in said upper active die, said highly conductive substrate being in electrical contact with said cathode of said silicon diode.

15 . The III-Nitride-silicon composite diode of claim 14 , wherein said highly conductive substrate comprises silicon.

16 . The III-Nitride-silicon composite diode of claim 11 , wherein said TSV reaches a bottom side of said upper active die.

17 . The III-Nitride-silicon composite diode of claim 11 , wherein said III-Nitride transistor is a normally ON transistor.

18 . The III-Nitride-silicon composite diode of claim 11 , wherein said III-Nitride transistor is a high-voltage (HV) transistor and said silicon diode is a low-voltage (LV) diode.

19 . The III-Nitride-silicon composite switch of claim 11 , wherein said III-Nitride transistor is a III-Nitride high electron mobility transistor (III-Nitride HEMT).

Assignments (2)
MERGER AND CHANGE OF NAME Recorded Apr 13, 2016
From: INFINEON TECHNOLOGIES NORTH AMERICA CORP.; INTERNATIONAL RECTIFIER CORPORATION; INTERNATIONAL RECTIFIER CORPORATION
To: INFINEON TECHNOLOGIES AMERICAS CORP.
Reel/Frame 038463/0859 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 1, 2013
From: BRIERE, MICHAEL A.; MCDONALD, TIM
To: INTERNATIONAL RECTIFIER CORPORATION
Reel/Frame 029908/0337 →