HIGH FREQUENCY HEATING APPARATUS
A high frequency heating apparatus which heats a substrate by applying high frequency waves. The high frequency heating apparatus includes a high frequency generator which generates high frequency to heat the substrate and a reflector which reflects the high frequency generated by the high frequency generator toward the substrate.
1 . A high frequency heating apparatus comprising:
a high frequency generator which generates high frequency to heat a substrate; and
a reflector which reflects the high frequency generated by the high frequency generator toward the substrate.
2 . The high frequency heating apparatus of claim 1 , wherein
the high frequency generator comprises a plurality of high frequency generators, and
the reflector partitions the plurality of high frequency generators into groups each including at least one high frequency generator of the plurality of high frequency generators.
3 . The high frequency heating apparatus of claim 2 , wherein the reflector comprises a first reflecting portion which forms a partition between high frequency generators of the plurality of high frequency generators which are spaced apart from each other.
4 . The high frequency heating apparatus of claim 3 , wherein the first reflecting portion forms the partition between high frequency generators of the plurality of high frequency generators which are spaced apart from each other in a direction from a front to a rear, the direction from the front to the rear being a direction in which the substrate is carried.
5 . The high frequency heating apparatus of claim 3 , wherein
the plurality of high frequency generators are arranged in a plurality of rows, and
the first reflecting portion partitions the rows of high frequency generators.
6 . The high frequency heating apparatus of claim 3 , wherein a distance from the high frequency generators of the plurality of high frequency generators which are spaced apart from each other to the first reflecting portion is n/2*λ, where n is a natural number ranging from 1 to 12, and λ is a wavelength of the high frequency that is generated by the plurality of high frequency generators.
7 . The high frequency heating apparatus of claim 3 , wherein a distance from the substrate to the first reflecting portion is 4 cm or less.
8 . The high frequency heating apparatus of claim 1 , wherein the reflector comprises a second reflecting portion which is disposed on a left side and/or a right side of the high frequency generator, a direction from the left side to the right side intersecting a direction in which the substrate is carried.
9 . The high frequency heating apparatus of claim 8 , wherein
the high frequency generator comprises a plurality of high frequency generators which are arranged in at least one row, and
the second reflecting portion is disposed on the left side and/or the right side of the at least one row of the plurality of high frequency generators.
10 . The high frequency heating apparatus of claim 9 , wherein a distance from the row of high frequency generators to the second reflecting portion is 2λ, where λ is a wavelength of the high frequency that is generated by the plurality of high frequency generators.
11 . The high frequency heating apparatus of claim 1 , wherein the reflector comprises a third reflecting portion which is disposed above and/or below the substrate, a main plane of the third reflecting portion facing a main plane of the substrate.
12 . The high frequency heating apparatus of claim 11 , wherein a distance from the third reflecting portion to the substrate is n/2*λ, where n is a natural number ranging from 1 to 6, and λ is a wavelength of the high frequency that is generated by the high frequency generator.
13 . The high frequency heating apparatus of claim 1 , wherein the reflector surrounds the high frequency generator from a front, a rear, a left side and a right side, a direction from the front to the rear being a direction in which the substrate is carried, and a direction from the left side to the right side being a direction that intersects the direction in which the substrate is carried.
14 . The high frequency heating apparatus of claim 1 , wherein the reflector is disposed at corresponding positions above and below the substrate.
15 . The high frequency heating apparatus of claim 1 , wherein the reflector has a plurality of holes.
16 . The high frequency heating apparatus of claim 15 , wherein a diameter of the holes is 3 mm or less.