High frequency heating apparatus
A high frequency heating apparatus which heats a substrate by applying high frequency waves thereto. The high frequency heating apparatus includes a high frequency generator which generates high frequency to heat the substrate. The distance from the substrate to the high frequency generator is n/2*λ, where n is a natural number ranging from 1 to 6, and λ is the wavelength of the high frequency that is generated by the high frequency generator.
1. A high frequency heating apparatus comprising a plurality of high frequency generators disposed over a glass substrate to be carried in a first direction and spaced apart from each other in the first direction, each of the plurality of high frequency generators generating high frequency to heat the glass substrate, the high frequency ranging from 0.98 GHz to 6.0 GHz,
wherein a distance from the glass substrate to each of the plurality of high frequency generators is (n═/2)*λ, where n′ is a natural number ranging from 1 to 6, and λ is a wavelength of the high frequency.
2. The high frequency heating apparatus of claim 1 , wherein the plurality of high frequency generators are respectively arranged at distances expressed by (n″/2)*λ, where n″ is a natural number ranging from 1 to 12.
3. A high frequency heating apparatus comprising a plurality of high frequency generators disposed over a glass substrate to be carried in a first direction and spaced apart from each other in the first direction, each of the plurality of high frequency generators generating high frequency to heat the glass substrate, the high frequency ranging from 0.98 GHz to 6.0 GHz,
wherein the plurality of high frequency generators are arranged at distances expressed by (n″/2)*λ, where n″ is a natural number ranging from 1 to 12, and λ is a wavelength of the high frequency.
4. The high frequency heating apparatus of claim 1 , further comprising a reflector which reflects the high frequency toward the glass substrate.
5. The high frequency heating apparatus of claim 4 , wherein the reflector partitions the plurality of high frequency generators into groups each including at least one high frequency generator of the plurality of high frequency generators.
6. The high frequency heating apparatus of claim 5 , wherein the reflector comprises a first reflecting portion which forms a partition between the plurality of high frequency generators.
7. The high frequency heating apparatus of claim 6 , wherein
the plurality of high frequency generators comprises at least one row of high frequency generators arranged in a second direction intersecting the first direction.
8. The high frequency heating apparatus of claim 6 , wherein a distance from each of the plurality of high frequency generators to the first reflecting portion is (n″/2)*λ, where n″ is a natural number from 1 to 12.
9. The high frequency heating apparatus of claim 6 , wherein a distance from the glass substrate to the first reflecting portion is 4 cm or less.
10. The high frequency heating apparatus of claim 4 , wherein the reflector comprises a second reflecting portion which is disposed on at least one of a left side and a right side of the plurality of high frequency generators, a direction from the left side to the right side defining a second direction intersecting the first direction.
11. The high frequency heating apparatus of claim 10 , wherein a distance from the plurality of high frequency generators to the second reflecting portion is 2λ or less.
12. The high frequency heating apparatus of claim 10 , wherein
the plurality of high frequency generators comprises at least one row of high frequency generators arranged in the second direction.
13. The high frequency heating apparatus of claim 4 , wherein the reflector comprises a third reflecting portion which is disposed at least one of above and below the glass substrate, a main plane of the third reflecting portion facing a main plane of the glass substrate.
14. The high frequency heating apparatus of claim 13 , wherein a distance from the third reflecting portion to the glass substrate is (n″″/2)*λ, where n″″ is a natural number ranging from 1 to 6.
15. The high frequency heating apparatus of claim 4 , wherein the reflector surrounds the plurality of high frequency generators from a front and a rear in the first direction, and from a left side and a right side in a second intersecting the first direction.
16. The high frequency heating apparatus of claim 4 , wherein the reflector is disposed at corresponding positions that are above and below the glass substrate.
17. The high frequency heating apparatus of claim 4 , wherein the reflector has a plurality of holes.
18. The high frequency heating apparatus of claim 17 , wherein a diameter of the holes is 3 mm or less.