IP Library Granted Patent US 8,629,979
Granted Patent B2
US 8,629,979 · App. 13/817,545 · Granted Jan 14, 2014

Inspection system, inspection method, and program

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Quick Facts
Patent No.
US 8,629,979
App. No.
13/817,545
Granted
Jan 14, 2014
Kind
B2
Abstract

Setting a spatial filter requires repeatedly confirming a scan image through visual inspection by an operator and adjusting the spatial filter. A setting state is also dependent on the operator. Therefore, in the present invention, a scattered light image (beam image) and a diffracted light image (Fourier image) are simultaneously observed, and an intensity profile of the scattered light image (beam image) and an intensity profile of the diffracted light image (Fourier image) are simultaneously monitored. A field of view of a diffracted light image is scanned with only one spatial filter, and a state change with respect to the intensity profiles in the absence of insertion of the spatial filter is detected. A setting condition for a spatial filter is determined on the basis of the detected state change.

Claims (21)

1. An inspection system for inspecting a surface of an item to be inspected, the inspection apparatus comprising:

an irradiation unit that irradiates inspection light onto the item to be inspected;

a scattered light observation unit that observes an image of scattered light produced at or near the surface of the item to be inspected;

a diffracted light observation unit that observes an image of diffracted light as the Fourier transform of the scattered light produced at or near the surface of the item to be inspected;

a spatial filter unit that blocks some of the diffracted light;

a detection unit that detects the intensity and position of the scattered light produced at or near the surface of the item to be inspected;

a stage unit that can be moved at a variable speed with the item to be inspected mounted thereon;

a processing unit that processes information detected by the detection unit;

a display unit that displays the information processed by the processing unit;

a spatial filter setting unit that observes an intensity profile of the scattered light image and an intensity profile of the diffracted light image simultaneously, and determines a setting condition for a spatial filter for selectively blocking the diffracted light due to a specific pattern on the surface of the item to be inspected on the basis of an observation result; and

wherein the spatial filter setting unit scans a diffracted light observation field of view with a single spatial filter unit, and monitors a state change with respect to the intensity profile of the scattered light image and the intensity profile of the diffracted light image in the absence of insertion of the spatial filter unit simultaneously.

2. The inspection system according to claim 1 , wherein the spatial filter setting unit stores a position of the state change in the intensity profile of the scattered light image and a position at which the state change in the intensity profile of the diffracted light image is detected, and determines the setting condition for the spatial filter on the basis of a combination of the two state changes.

3. The inspection system according to claim 2 , wherein the spatial filter setting unit determines the number, width, interval, and arrangement of the spatial filter unit as the setting condition.

4. A method of inspecting a surface of an item to be inspected by using an inspection system, the method comprising the steps of:

the inspection system irradiating inspection light onto the item to be inspected;

the inspection system observing an image of scattered light produced at or near the surface of the item to be inspected;

the inspection system observing an image of diffracted light as the Fourier transform of the scattered light produced at or near the surface of the item to be inspected;

the inspection system observing an intensity profile of the scattered light image and an intensity profile of the diffracted light image simultaneously, and determining a setting condition for a spatial filter for selectively blocking the diffracted light due to a specific pattern on the surface of the item to be inspected on the basis of an observation result; and

the inspection system scanning a diffracted light observation field of view with a single spatial unit, and monitoring a state change with respect to the intensity profile of the scattered light image and the intensity profile of the diffracted light image in the absence of insertion of the spatial filter unit simultaneously.

5. The inspection method according to claim 4 , further comprising a step of storing a position of the state change in the intensity profile of the scattered light image and a position at which the state change in the intensity profile of the diffracted light image is detected, and determining the setting condition for the spatial filter unit on the basis of a combination of the two state changes.

6. The inspection method according to claim 5 , further comprising a step of determining the number, width, interval, and arrangement of the spatial filter unit as the setting condition.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →