Support for semiconductor substrate
View Patent ↗A moveable semiconductor substrate support includes a control device receiving data from one or more sensors and providing control signals to one or more actuators. The control device is coupled to and moves with the moveable substrate support to facilitate flexible and complex operation of the substrate support itself.
1. A moveable semiconductor substrate support comprising:
an XY stage for movement in an XY plane;
a rotary stage mounted upon the XY stage, the rotary stage for rotation about an axis normal to the XY plane of motion of the XY stage;
a top plate coupled to the rotary stage, the top plate having an upper surface nominally parallel to the XY plane of the XY stage;
a control device emplaced within the moveable semiconductor substrate support, the control device coupled to one or more actuators in the top plate and to one or more sensors in the top plate;
the control device receiving data from the one or more sensors and providing control signals to the one or more actuators, the control signals being based at least in part on the data obtained from the at least one sensor;
the one or more actuators being operatively coupled to one or more substrate control mechanisms which are cycled between at least two states by the one or more actuators.
2. The moveable semiconductor substrate support of claim 1 wherein one of the substrate control mechanisms is a vacuum hold-down comprising:
an inner seal defining a first vacuum plenum at an upper surface of the top plate;
an outer seal defining a second vacuum plenum at an upper surface of the top plate, the second vacuum plenum being circumjacent to the first vacuum plenum.
3. The moveable semiconductor substrate support of claim 2 wherein at least one actuator is a vacuum pressure valve cycled by the control device between a first state in which vacuum pressure is applied to the first vacuum plenum and a second state in which vacuum pressure is not applied to the first vacuum plenum.
4. The moveable semiconductor substrate support of claim 2 wherein at least one actuator is a vacuum pressure valve cycled by the control device between a first state in which vacuum pressure is applied to the second vacuum plenum and a second state in which vacuum pressure is not applied to the second vacuum plenum.
5. The moveable semiconductor substrate support of claim 2 wherein at least one actuator is a single vacuum pressure valve adapted to cycle both the first and second vacuum plenums between their first and second states.
6. The moveable semiconductor substrate support of claim 2 comprising at least three vacuum plenums in the top plate.
7. The moveable semiconductor substrate support of claim 1 wherein one of the substrate control mechanisms is a set of lift pins that reciprocate with respect to the top plate between a first position in which the lift pins are fully retracted into and beneath an upper surface of the top plate and a second position in which each of the set of lift pins is extended above the surface of the top plate.
8. The moveable semiconductor substrate support of claim 7 wherein at least one actuator is cycled by the control device to move the set of lift pins between their first and second positions.
9. The moveable semiconductor substrate support of claim 7 wherein each of the set of lift pins further comprises a suction cup at a distal end of the lift pin, each suction cup being selectively coupled by at least one actuator to a source of vacuum pressure.
10. The moveable semiconductor substrate support of claim 1 wherein the control device is mounted on the XY stage and moves therewith.
11. The moveable semiconductor substrate support of claim 10 further comprising a rotary coupling for providing a supply of vacuum pressure and an electrical connection to the top plate, the supply of vacuum pressure being coupled to at least one actuator and the electrical connection being connected to the control device and to at least one actuator and to at least one sensor in the top plate.
12. The moveable semiconductor substrate support of claim 1 wherein the control device is mounted on the top plate and both moves and rotates therewith.
13. The moveable semiconductor substrate support of claim 12 further comprising a rotary coupling for providing at least a supply of vacuum pressure and an electrical connection to the top plate, the supply of vacuum pressure being coupled to at least one actuator and the electrical connection connecting the control device and to an external controller.
14. The moveable semiconductor substrate support of claim 1 wherein the top plate comprises:
a base coupled to the rotation stage; and
at least one support surface removably coupled to the base, the at least one support surface being adapted to support a selected semiconductor substrate.
15. The moveable semiconductor substrate support of claim 14 further comprising a first support surface having a vacuum hold-down comprising a seal defining a vacuum plenum at an upper surface of the support surface, a second support surface and an outer seal defining a second vacuum plenum at an upper surface of the top plate, the second vacuum plenum being circumjacent to the first vacuum plenum.
16. The moveable semiconductor substrate support of claim 14 wherein the control device is coupled to an identifying structure in the at least one support surface, the identifying structure providing a unique identity for each of the at least one support surfaces.
17. The moveable semiconductor substrate support of claim 14 wherein the base and the rotary stage further comprise a rotary coupling for providing at least a supply of vacuum pressure and an electrical connection to the at least one support surface.
18. The moveable semiconductor substrate support of claim 17 wherein one of the substrate control mechanisms is a vacuum hold-down comprising:
an inner seal defining a first vacuum plenum at an upper surface of the top plate;
an outer seal defining a second vacuum plenum at an upper surface of the top plate, the second vacuum plenum being circumjacent to the first vacuum plenum.
19. The moveable semiconductor substrate support of claim 18 wherein at least one actuator is a vacuum pressure valve cycled by the control device between a first state in which vacuum pressure is applied to the first vacuum plenum and a second state in which vacuum pressure is not applied to the first vacuum plenum.
20. The moveable semiconductor substrate support of claim 18 wherein at least one actuator is a vacuum pressure valve cycled by the control device between a first state in which vacuum pressure is applied to the second vacuum plenum and a second state in which vacuum pressure is not applied to the second vacuum plenum.