Method for processing a carrier
A method for processing a carrier may include: forming a plurality of structure elements at least one of over and in a carrier, wherein at least two adjacent structure elements of the plurality of structure elements have a first distance between each other; depositing a first layer over the plurality of structure elements having a thickness which equals the first distance between the at least two adjacent structure elements; forming at least one additional layer over the first layer, wherein the at least one additional layer covers an exposed surface of the first layer; removing a portion of the at least one additional layer to expose the first layer partially; and partially removing the first layer, wherein at least one sidewall of the at least two adjacent structure elements is partially exposed.
1. A method for processing a carrier, the method comprising:
forming a plurality of structure elements at least one of over and in the carrier, wherein at least two adjacent structure elements of the plurality of structure elements have a first distance between each other, and wherein at least two adjacent structure elements of the plurality of structure elements have a distance between each other which is larger than two times the first distance;
depositing a first layer over the plurality of structure elements, the first layer having a thickness which equals the first distance between the at least two adjacent structure elements;
forming at least one additional layer over the first layer, wherein the at least one additional layer covers an exposed surface of the first layer;
removing a portion of the at least one additional layer to expose the first layer partially, wherein a remaining part of the at least one additional layer, which is disposed between the at least two adjacent structure elements of the plurality of structure elements having the distance between each other which is larger than two times the first distance, is spaced apart from these at least two adjacent structure elements with the first distance; and subsequently,
partially removing the exposed first layer, wherein at least one sidewall of the plurality of structure elements is partially exposed.
2. The method of claim 1 ,
the plurality of structure elements comprising at least one electrically insulating layer at a surface of at least one structure element of the plurality of structure elements.
3. The method of claim 2 , wherein
the at least one electrically insulating layer comprises an oxide layer.
4. The method of claim 1 , wherein
at least one structure element of the plurality of structure elements has the shape of a fin.
5. The method of claim 1 , wherein
at least one structure element of the plurality of structure elements is part of a FinFET.
6. The method of claim 1 , wherein depositing the first layer over the plurality of structure elements comprises conformally depositing the first layer over the plurality of structure elements.
7. The method of claim 1 , wherein
the first layer comprises electrically conductive material.
8. The method of claim 1 , wherein
the first layer comprises electrically conductive polycrystalline silicon.
9. The method of claim 1 , wherein
forming the at least one additional layer comprises depositing at least one layer using a conformal deposition process.
10. The method of claim 1 , wherein
forming the at least one additional layer comprises growing at least one layer using high temperature oxidation.
11. The method of claim 1 , wherein
the at least one additional layer comprises a material that is different from a material of the first layer.
12. The method of claim 1 , wherein
forming the at least one additional layer comprises:
forming at least a second layer over the first layer,
wherein the second layer fills a remaining space between adjacent structure elements of the plurality of structure elements.