CHEMICAL LIQUID PREPARATION METHOD OF PREPARING A CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, CHEMICAL LIQUID PREPARATION UNIT PREPARING A CHEMICAL LIQUID FOR SUBSTRATE PROCESSING, AND SUBSTRATE PROCESSING SYSTEM
A substrate processing system includes a chemical liquid preparation unit preparing a chemical liquid to be supplied to a substrate and a processing unit which supplies the chemical liquid, prepared by the chemical liquid preparation unit, to the substrate. The chemical liquid preparation unit supplies an oxygen-containing gas, containing oxygen gas, to a TMAH-containing chemical liquid, containing TMAH (tetramethylammoniumhydroxide),tomaketheoxygen-containing gas dissolve in the TMAH-containing chemical liquid.
1 . A chemical liquid preparation method of preparing a chemical liquid for substrate processing, comprising:
a step of supplying an oxygen-containing gas that contains oxygen gas to a TMAH-containing chemical liquid that contains TMAH (tetramethylammonium hydroxide) to make the oxygen-containing gas dissolve in the TMAH-containing chemical liquid.
2 . The chemical liquid preparation method of preparing a chemical liquid for substrate processing according to claim 1 , wherein the oxygen-containing gas is oxygen gas or cleaned dry air.
3 . The chemical liquid preparation method of preparing a chemical liquid for substrate processing according to claim 1 , comprising:
a measurement step of measuring a dissolved oxygen concentration in the TMAH-containing chemical liquid;
a nitrogen dissolution step of supplying a nitrogen-containing gas containing nitrogen gas to the TMAH-containing chemical liquid to make the nitrogen-containing gas dissolve in the TMAH-containing chemical liquid when the dissolved oxygen concentration measured in the measurement step is higher than a predetermined concentration; and
an oxygen dissolution step of supplying the oxygen-containing gas to the TMAH-containing chemical liquid to make the oxygen-containing gas dissolve in the TMAH-containing chemical liquid when the dissolved oxygen concentration measured in the measurement step is lower than the predetermined concentration.
4 . A chemical liquid preparation unit preparing a chemical liquid for substrate processing, comprising:
an oxygen dissolution unit which supplies an oxygen-containing gas that contains oxygen gas to a TMAH-containing chemical liquid that contains TMAH (tetramethylammonium hydroxide) to make the oxygen-containing gas dissolve in the TMAH-containing chemical liquid.
5 . The chemical liquid preparation unit preparing a chemical liquid for substrate processing according to claim 4 , wherein the oxygen-containing gas is oxygen gas or cleaned dry air.
6 . The chemical liquid preparation unit preparing a chemical liquid for substrate processing according to claim 4 , further comprising:
a measurement unit which measures a dissolved oxygen concentration in the TMAH-containing chemical liquid;
a nitrogen dissolution unit which supplies a nitrogen-containing gas containing nitrogen gas to the TMAH-containing chemical liquid to make the nitrogen-containing gas dissolve in the TMAH-containing chemical liquid; and
a controller which controls the nitrogen dissolution unit to make the nitrogen-containing gas dissolve in the TMAH-containing chemical liquid when the dissolved oxygen concentration measured by the measurement unit is higher than a predetermined concentration and controls the oxygen dissolution unit to make the oxygen-containing gas dissolve in the TMAH-containing chemical liquid when the dissolved oxygen concentration measured by the measurement unit is lower than the predetermined concentration.
7 . A substrate processing system comprising:
the chemical liquid preparation unit according to claim 4 ; and
a processing unit which supplies the TMAH-containing chemical liquid, prepared by the chemical liquid preparation unit, to a substrate.
8 . A substrate processing system comprising: the chemical Liquid preparation unit according to claim 5 ; and
a processing unit which supplies the TMAH-containing chemical liquid, prepared by the chemical liquid preparation unit, to a substrate.
9 . A substrate processing system comprising: the chemical liquid preparation unit according to claim 6 ; and
a processing unit which supplies the TMAH-containing chemical liquid, prepared by the chemical liquid preparation unit, to a substrate.