Nonvolatile semiconductor memory device

1. A nonvolatile semiconductor memory device, comprising:

a memory cell array configured having a plurality of blocks arranged therein, each of the blocks configured as an arrangement of NAND cell units, each of the NAND cell units configured having a plurality of electrically rewritable memory cells and a select transistor connected in series; and

a row decoder configured to select any one of the blocks of the memory cell array and supply to any one of said blocks a voltage required in various kinds of operations,

the row decoder comprising: a first sub row decoder disposed on a first side of the memory cell array; and a second sub row decoder disposed on a second side which is an opposite side to the first side of the memory cell array,

the first sub row decoder comprising:

a plurality of first transfer transistors each disposed in a rectangular first region and connected to any one of the memory cells; and

a plurality of second transfer transistors disposed in a second region and connected to respective ones of the select transistors, the second region being a residual region of the first region, and the second sub row decoder comprising: a plurality of fifth transfer transistors each disposed in a rectangular third region and connected to any one of the memory cells; and a plurality of sixth transfer transistors disposed in a fourth region and connected to respective ones of the select transistors, the fourth region being a residual region of the third region.

2. The nonvolatile semiconductor memory device according to claim 1 , wherein

at least one of the plurality of second transfer transistors disposed in the second region and the plurality of sixth transfer transistors disposed in the fourth region share a drain/source diffusion region.

3. The nonvolatile semiconductor memory device according to claim 2 , wherein

at least one of the plurality of first transfer transistors and the plurality of fifth transfer transistors are disposed in a matrix in the first region or in the third region.

4. The nonvolatile semiconductor memory device according to claim 1 , wherein

a third transfer transistor and a fourth transfer transistor acting as the second transfer transistors are connected to a select gate line of the select transistors, the third transfer transistor connected to a drain side select transistor connected to a bit line, and the fourth transfer transistor connected to a source side select transistor connected to a source line, and

in the second region, a plurality of the third transfer transistors or a plurality of the fourth transfer transistors share a drain/source diffusion region.

5. The nonvolatile semiconductor memory device according to claim 1 , further comprising:

a guard ring formed between the first region and the second region or between the third region and the fourth region.

6. A nonvolatile semiconductor memory device, comprising:

a memory cell array configured having a plurality of blocks arranged therein, each of the blocks configured as an arrangement of NAND cell units, each of the NAND cell units configured having a plurality of electrically rewriteable memory cells and a select transistor connected in series; and

a row decoder configured to select any one of the blocks of the memory cell array and supply to any one of said blocks a voltage required in various kinds of operations,

the row decoder comprising: a first sub row decoder disposed on a first side of the memory cell array; and a second sub row decoder disposed on a second side which is an opposite side to the first side of the memory cell array,

the first sub row decoder comprising: a first gate circuit including a plurality of first transfer transistors disposed in a first region and connected to first ones of the memory cells, and plurality of second transfer transistors disposed in a second region and connected to respective ones of the select transistors, the second region being a residual region of the first region; and a boost circuit for generating a control signal supplied to a gate of the first transfer transistors and the second transfer transistors, and

the second sub row decoder comprising a second gate circuit that includes fifth transfer transistors disposed in a third the first region and connected to second ones of the memory cells, and sixth transfer transistors disposed in a fourth region and connected to respective ones of the select transistors, the fourth region being a residual region of the third region, and the fifth transfer transistors and the sixth transfer transistors being supplied with the control signal from the boost circuit in the first row decoder.

7. The nonvolatile semiconductor memory device according to claim 6 , wherein

a third transfer transistor and a fourth transfer transistor acting as the second transfer transistor are connected to a select gate line of the select transistor, and

a gate of the third transfer transistor is supplied with the control signal, and the fourth transfer transistor is supplied with a block select signal whose logic switches according to selection/non-selection of the block.

8. The nonvolatile semiconductor memory device according to claim 7 , wherein

the first sub row decoder further comprises a local row decoder configured to supply the block select signal to the fourth transfer transistor in the first sub row decoder and the fourth transfer transistor in the second sub row decoder.

9. The nonvolatile semiconductor memory device according to claim 6 , wherein

at least one of the plurality of second transfer transistors disposed in the second region and the plurality of sixth transfer transistors disposed in the fourth region share a drain/source diffusion region.

10. The nonvolatile semiconductor memory device according to claim 6 , wherein

at least one of the plurality of first transfer transistors and the plurality of third transfer transistors are disposed in a matrix in the first region.

11. The nonvolatile semiconductor memory device according to claim 6 , wherein

the first gate circuit includes the second region, the second gate circuit includes the fourth region, and

at least one of the second regions and the fourth regions of adjacent two of the first gate circuits or second gate circuits are disposed adjacently to each other to be continuous.

12. The nonvolatile semiconductor memory device according to claim 11 , wherein

at least one of the plurality of second transfer transistors disposed in the second region and the plurality of sixth transfer transistors disposed in the fourth region share a drain/source diffusion region.

13. The nonvolatile semiconductor memory device according to claim 11 , wherein

at least one of the plurality of first transfer transistors and the plurality of fifth transfer transistors are disposed in a matrix in the first region or in the third region.

14. The nonvolatile semiconductor memory device according to claim 6 , wherein

in one of the second gate circuits, the fifth transfer transistor is connected to a first block, and at least a portion of the sixth transfer transistors are connected to a second block which is distinct from the first block.

15. The nonvolatile semiconductor memory device according to claim 14 , wherein

the second gate circuit positioned at a first end in the second sub row decoder comprises a dummy transistor.

16. The nonvolatile semiconductor memory device according to claim 6 , further comprising:

a guard ring formed between the first region and the second region or between the third region and the fourth region.