FinFET with reduced capacitance

1. A method comprising:

providing a plurality of fins etched from a semiconductor substrate and covered by a dummy gate oxide;

depositing a gap fill material on top of the dummy gate oxide and in between the plurality of fins;

forming one or more openings between the plurality of fins and the gap fill material by selectively removing a portion of the dummy gate oxide; and

forming a gate within the one or more openings, and above the plurality of fins and the gap fill material.

2. The method of claim 1 , further comprising:

removing the dummy gate oxide and the gap fill material selective to a portion of the plurality of fins not covered by the gate; and

forming an epitaxially grown region (“EPI region”) above the portion of the plurality of fins not covered by the gate.

3. The method of claim 1 , further comprising:

forming an EPI region within the one or more openings and on a portion of the plurality of fins not covered by the gate.

4. The method of claim 2 , further comprising:

depositing a dielectric layer on top of the EPI regions.

5. The method of claim 1 , wherein depositing the gap fill material on top of the dummy gate oxide and in between the plurality of fins comprises:

removing a portion of the gap fill material to expose the dummy gate oxide.

6. The method of claim 1 , wherein depositing the gap fill material on top of the dummy gate oxide and in between the plurality of fins comprises:

depositing a material that will allow for the removal of the dummy gate oxide selective to the gap fill material.

7. The method of claim 1 , wherein depositing the gap fill material on top of the dummy gate oxide and in between the plurality of fins comprises:

depositing a material that has a slower etch rate than the dummy gate oxide material under the same etch conditions.

8. The method of claim 1 , wherein depositing the gap fill material on top of the dummy gate oxide and in between the plurality of fins comprises:

depositing silicon nitride.

9. The method of claim 1 , wherein forming a gate within the one or more openings, and above the plurality of fins and the gap fill material comprises:

depositing a high-k gate dielectric material;

depositing one or more work function metals; and

depositing a low resistance metal.

10. The method of claim 1 , wherein forming a gate within the one or more openings, and above the plurality of fins and the gap fill material comprises:

using a gate last fabrication technique.

11. A method comprising:

providing fins etched from a semiconductor substrate and conformally covered by a dummy gate oxide;

depositing a gap fill material directly on top of the dummy gate oxide and in between the fins such that a portion of the dummy gate oxide immediately above the fins remains exposed;

depositing a dummy gate directly on top of the dummy gate oxide and directly on top of the gap fill material;

patterning the dummy gate, the gap fill material, and the dummy gate oxide into dummy gate lines oriented perpendicular to the fins, a portion of the fins not covered by the dummy gate lines are exposed, and a portion of the gap fill material remains covered by the dummy gate;

forming spacers directly on opposite sidewalls of the dummy gate lines, including on the sidewalls of the dummy gate, the sidewalls of the gap fill material and sidewalls of the dummy gate oxide;

removing the dummy gate from between the spacers exposing the dummy gate oxide and the gap fill material;

forming one or more openings between the fins and the gap fill material by selectively removing a portion of the dummy gate oxide, another portion of the dummy gate oxide remaining directly beneath the gap fill material; and

forming a gate within the one or more openings, the gate is in direct contact with both the fins and the gap fill material.

12. The method of claim 11 , wherein a top surface of the gap fill material is at or below a top surface of the fins.

13. The method of claim 11 , wherein a top surface and two opposite sides of the gap fill material are in direct contact with the gate, a bottom surface of the gap fill material is in direct contact with the remaining portion of the dummy gate oxide, and a front surface and a back surface are both in direct contact with the spacers.

14. The method of claim 11 , further comprising:

forming an epitxially grown region directly on a portion of the fins not covered by the dummy gate lines, the epitaxially grown region is in direct contact with multiple adjacent fins; and

depositing a dielectric layer on top of the epitaxially grown region.

15. A method comprising:

providing fins etched from a semiconductor substrate and conformally covered by a dummy gate oxide;

depositing a gap fill material directly on top of the dummy gate oxide and in between the fins such that a portion of the dummy gate oxide immediately above the fins remains exposed;

depositing a dummy gate directly on top of the dummy gate oxide and directly on top of the gap fill material;

patterning the dummy gate into dummy gate lines oriented perpendicular to the fins, the dummy gate is patterned selective to the gap fill material and the dummy gate oxide;

forming spacers directly on opposite sidewalls of the dummy gate lines, including sidewalls of the dummy gate and excluding sidewalls of the gap fill material and sidewalls of the dummy gate oxide;

forming a first opening in a source drain region by selectively removing a portion of the dummy gate oxide remaining uncovered by the dummy gate lines, the first opening is between the fins and the gap fill material in the source drain region;

removing the dummy gate from between the spacers exposing the dummy gate oxide and the gap fill material in a gate region;

forming a second opening in the gate region by selectively removing another portion of the dummy gate oxide uncovered by the dummy gate lines, the second opening is between the fins and the gap fill material in the gate region; and

forming a gate within the second opening, the gate is in direct contact with both the fins and the gap fill material in the gate region.

16. The method of claim 15 , wherein a top surface of the gap fill material is at or below a top surface of the fins.

17. The method of claim 15 , wherein the gate is in direct contact with a top surface and two opposite sides of the gap fill material, a bottom surface of the gap fill material is in direct contact with a remaining portion of the dummy gate oxide, and a front surface and a back surface of the dummy gate oxide are both in direct contact with the spacers.

18. The method of claim 15 , further comprising:

forming an epitxially grown region directly on a portion of the fins in the source drain region, the epitaxially grown region extends outwardly from the fins until physically contacting the gap fill material in the source drain region; and

depositing a dielectric layer on top of the epitaxially grown region.

19. The method of claim 15 , wherein another portion of the dummy gate oxide remains directly beneath the gap fill material in both the source drain region and in the gate region.