Resist composition, method of forming resist pattern, and polymeric compound
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resist composition including a base component that exhibits changed solubility in a developing solution under the action of acid, the base component containing a resin component having a structural unit represented by general formula (a0-1) shown below: in which R 1 represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms, R 2 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, and X represents an oxygen atom, a sulfur atom, or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom.
1. A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, wherein
the resist composition comprises a base component (A) that exhibits changed solubility in a developing solution under action of acid, and
the base component (A) comprises a resin component (A1) having a structural unit (a0) represented by general formula (a0-1) shown below:
wherein R 1 represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms, R 2 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, and X represents an oxygen atom, a sulfur atom, or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom.
2. The resist composition according to claim 1 , wherein the resin component (A1) has a structural unit (a1) comprising an acid-decomposable group that exhibits increased polarity under action of acid, provided that the structural unit (a0) is excluded from the structural unit (a1).
3. The resist composition according to claim 1 , wherein the resin component (A1) has a structural unit (a5) comprising an —SO 2 -containing cyclic group, provided that the structural unit (a0) is excluded from the structural unit (a5).
4. A method of forming a resist pattern, comprising:
forming a resist film on a substrate using the resist composition according to claim 1 ;
exposing the resist film; and
developing the resist film to form a resist pattern.
5. A polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below:
wherein R 1 represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms, R 2 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, and X represents an oxygen atom, a sulfur atom, or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom.
6. The polymeric compound according to claim 5 , having a structural unit (a1) comprising an acid-decomposable group that exhibits increased polarity under action of acid, provided that the structural unit (a0) is excluded from the structural unit (a1).
7. The polymeric compound according to claim 5 , having a structural unit (a5) comprising an —SO 2 -containing cyclic group, provided that the structural unit (a0) is excluded from the structural unit (a5).