IP Library › Granted Patent US 9,147,631
Granted Patent B2
US 9,147,631 · App. 13/864,350 · Granted Sep 29, 2015

Semiconductor power device having a heat sink

Inventors: Ralf Otremba (Kaufbeuren, DE); Josef Hoeglauer (Heimstetten, DE); Juergen Schredl (Mering, DE); Xaver Schloegel (Sachsenkam, DE); Klaus Schiess (Allensbach, DE)
Assignee: Infineon Technologies Austria AG
H01L23/34H01L21/50H01L23/495H01L23/49513H01L23/49524H01L23/49562H01L23/49568H01L24/33H01L24/34H01L2224/32245H01L2224/83192H01L2924/12032H01L2924/1305H01L2924/13055H01L2924/13062H01L2924/13091
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Quick Facts
Patent No.
US 9,147,631
App. No.
13/864,350
Granted
Sep 29, 2015
Kind
B2
Abstract

A semiconductor device includes an electrically conducting carrier having a mounting surface. The semiconductor device further includes a metal block having a first surface facing the electrically conducting carrier and a second surface facing away from the electrically conducting carrier. A semiconductor power chip is disposed over the second surface of the metal block.

Claims (36)

1. A semiconductor device, comprising:

an electrically conducting carrier having a mounting surface;

a metal block having a first surface facing the carrier and a second surface facing away from the electrically conducting carrier;

a semiconductor power chip disposed over the second surface of the metal block, the semiconductor power chip having a first surface which faces the second surface of the metal block and a second surface opposite the first surface; and

a contact clip electrically and mechanically connected to a load electrode of the semiconductor power chip, the load electrode being arranged at the second surface of the power semiconductor chip.

2. The semiconductor device of claim 1 , further comprising:

a first bonding layer mechanically and electrically connecting the mounting surface of the electrically conducting carrier to the first surface of the metal block.

3. The semiconductor device of claim 2 , wherein the first bonding layer is a diffusion solder layer, a soft solder layer, a sintered metal layer, a nanopaste layer, or a conducting adhesive layer.

4. The semiconductor device of claim 2 , further comprising:

a second bonding layer mechanically and electrically connecting the second surface of the metal block to the first surface of the semiconductor power chip.

5. The semiconductor device of claim 4 , wherein the second bonding layer is a diffusion solder layer, a soft solder layer, a sintered metal layer, a nanopaste layer, or a conducting adhesive layer.

6. The semiconductor device of claim 1 , wherein the metal block has a thickness measured between the first and second surfaces of the metal block of equal to or greater than 0.5 mm, 0.75 mm, 1.0 mm, 1.25 mm, or 1.5 mm.

7. The semiconductor device of claim 1 , wherein the metal block has a thickness measured between the first and second surfaces of the metal block of equal to or greater than 1.5, 2.0, 3.0, 4.0, or 5.0 times the thickness of the electrically conducting carrier.

8. The semiconductor device of claim 1 , wherein an area size of the first surface of the metal block is equal to or greater than 8.0 mm 2 , 14.0 mm 2 , 20.0 mm 2 , or 26.0 mm 2 .

9. The semiconductor device of claim 1 , wherein an area size of a first surface of the semiconductor power chip connected to the second surface of the metal block is equal to or less than 10.0 mm 2 , 7.5 mm 2 , 5.0 mm 2 , 2.5 mm 2 , or 1.0 mm 2 .

10. The semiconductor device of claim 1 , wherein an area size of the first surface of the metal block is equal to or greater than 3Tm·(3Tm/4+Fc 0.5 ) +Fc, wherein Tm is the thickness of the metal block measured between the first and second surfaces of the metal block and Fc is an area size of a first surface of the semiconductor power chip connected to the second surface of the metal block.

11. The semiconductor device of claim 1 , wherein an area size of the first surface of the metal block is equal to or greater than 4Tm·(Tm+Fc 0.5 )+Fc, wherein Tm is the thickness of the metal block measured between the first and second surfaces of the metal block and Fc is an area size of a first surface of the semiconductor power chip connected to the second surface of the metal block.

12. The semiconductor device of claim 1 , wherein the semiconductor power chip is a vertical semiconductor power chip.

13. The semiconductor device of claim 1 , wherein the semiconductor power chip is a GaN-power chip, Si-power chip, or SiC-power chip.

14. The semiconductor device of claim 1 , wherein a thermal power of the semiconductor power chip is equal to or greater than 3.0 W, 5.0 W, 7.0 W, or 9.0 W.

15. The semiconductor device of claim 1 , wherein the semiconductor device is an AC-DC converter or a DC-DC converter.

16. A semiconductor device, comprising:

an electrically conducting carrier having a mounting surface;

a metal block having a first surface facing the carrier and a second surface facing away from the electrically conducting carrier; and

a semiconductor power chip disposed over the second surface of the metal block,

wherein the metal block has a thickness measured between the first and second surfaces of the metal block of equal to or greater than 0.5 mm, 0.75 mm, 1.0 mm, 1.25 mm, or 1.5 mm.

17. A semiconductor device, comprising:

an electrically conducting carrier having a mounting surface;

a metal block having a first surface facing the carrier and a second surface facing away from the electrically conducting carrier; and

a semiconductor power chip disposed over the second surface of the metal block,

wherein an area size of the first surface of the metal block is equal to or greater than 8.0 mm 2 , 14.0 mm 2 , 20.0 mm 2 , or 26.0 mm 2 .

18. A semiconductor device, comprising:

an electrically conducting carrier having a mounting surface;

a metal block having a first surface facing the carrier and a second surface facing away from the electrically conducting carrier; and

a semiconductor power chip disposed over the second surface of the metal block,

wherein an area size of a first surface of the semiconductor power chip connected to the second surface of the metal block is equal to or less than 10.0 mm 2 , 7.5 mm 2 , 5.0 mm 2 , 2.5 mm 2 , or 1.0 mm 2 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 17, 2013
From: OTREMBA, RALF; HOEGLAUER, JOSEF; SCHREDL, JUERGEN; SCHLOEGEL, XAVER; SCHIESS, KLAUS
To: INFINEON TECHNOLOGIES AUSTRIA AG
Reel/Frame 030230/0941 →
Continuity (1)
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