IP Library Patent Application 13865448
Patent Application
App. No. 13/865,448

SEMICONDUCTOR DEVICE, MANUFACTURING METHOD AND TRANSISTOR CIRCUIT

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Quick Facts
Patent No.
US None
App. No.
13/865,448
Abstract

A transistor circuit includes a first high electron mobility transistor and a second high electron mobility transistor having a negative threshold voltage, wherein a source of the second high electron mobility transistor is coupled to a gate of the first high electron mobility transistor, and a gate of the second high electron mobility transistor is coupled to a source of the first high electron mobility transistor.

Claims (20)

1 . A semiconductor device comprising:

a first compound semiconductor film;

a laminated film in which a second compound semiconductor film and an insulating film are laminated and

an electrode including a first portion embedded in a recess formed on the laminated film and a second portion extending on both the first portion and the insulating film,

wherein the first portion includes a first embedded portion including a first length in an extending direction of the second portion and a second embedded portion disposed between the first embedded portion and a bottom of the recess with a second length smaller than the first length.

2 . The semiconductor device according to claim 1 ,

wherein the recess reaches inside the second compound semiconductor film.

3 . The semiconductor device according to claim 1 ,

wherein the recess reaches a surface of the second compound semiconductor film or is stopped inside the first insulating film.

4 . The semiconductor device according to claim 1 ,

wherein an insulating layer is provided between the electrode and the laminated film.

5 . The semiconductor device according to claim 1 ,

wherein the second portion expands to both sides of the first portion, and

the first embedded portion expands to both sides of the second embedded portion.

6 . The semiconductor device according to claim 1 ,

wherein the semiconductor device is a high electron mobility transistor,

the first compound semiconductor film is a channel layer of the high electron mobility transistor,

the second compound semiconductor film is a barrier layer of the high electron mobility transistor,

the electrode is an electrode in which a gate and two field plates are combined, and

the extending direction is a direction from the source toward the drain of the high electron mobility transistor.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 9, 2014
From: FUJITSU SEMICONDUCTOR LIMITED
To: TRANSPHORM JAPAN, INC.
Reel/Frame 032865/0131 →