Wafer edge inspection illumination system
View Patent ↗Wafer edge inspection approaches are disclosed wherein an imaging device captures at least one image of an edge of a wafer. The at least one image can be analyzed in order to identify an edge bead removal line. An illumination system having a diffuser can further be used in capturing images.
1. A wafer edge illumination system comprising:
a diffuser having a slot formed therein for accepting a wafer edge, the diffuser being adapted to radiate lambertian light onto the wafer edge;
at least one light source directed directly into the diffuser with substantially no stray light being emitted and such that light emitted by the diffuser is incident upon the wafer edge in a diffuse, lambertian fashion;
a pair of parallel light baffles, each of the pair having a slot formed therein for accepting the wafer edge and each positioned to either side of the diffuser to prevent stray light from contacting the diffuser and to prevent stray light from escaping the diffuser such that the diffuser is a high efficiency light source for illuminating the edge of the wafer.
2. The illumination system of claim 1 wherein the at least one light source is a brightfield illumination source and wherein the system further includes a darkfield illumination source for illuminating a field of view of the wafer edge simultaneous with the illumination of the wafer edge by the diffuser from the brightfield illumination source the baffles acting to separate the illumination sources.
3. The illumination system of claim 2 wherein the brightfield illumination source and the darkfield illumination source are of different wavelengths.
4. The illumination system of claim 3 wherein there exists substantially no optical coupling between the brightfield illumination source and the darkfield illumination source.