IP Library Granted Patent US 8,779,513
Granted Patent B2
US 8,779,513 · App. 13/869,037 · Granted Jul 15, 2014

Non-planar semiconductor structure

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Quick Facts
Patent No.
US 8,779,513
App. No.
13/869,037
Granted
Jul 15, 2014
Kind
B2
Abstract

A non-planar semiconductor structure includes a substrate, at least two fin-shaped structures, at least an isolation structure, and a plurality of epitaxial layers. The fin-shaped structures are located on the substrate. The isolation structure is located between the fin-shaped structures, and the isolation structure has a nitrogen-containing layer. The epitaxial layers respectively cover a part of the fin-shaped structures and are located on the nitrogen-containing layer. A non-planar semiconductor process is also provided for forming the semiconductor structure.

Claims (14)

1. A non-planar semiconductor structure, comprising:

a substrate;

at least two fin-shaped structures located on the substrate;

at least an isolation structure located between the fin-shaped structures, the isolation structure and the fin-shaped structures having a nitrogen-containing layer; and

a plurality of epitaxial layers respectively covering a part of the fin-shaped structures and located on the nitrogen-containing layer.

2. The non-planar semiconductor structure according to claim 1 , wherein the substrate comprises a silicon substrate or a silicon-on-insulator substrate.

3. The non-planar semiconductor structure according to claim 1 , further comprising a gate structure covering the fin-shaped structures between the epitaxial layers.

4. The non-planar semiconductor structure according to claim 3 , wherein the gate structure further comprises:

a gate dielectric layer covering the fin-shaped structures;

a gate electrode covering the gate dielectric layer;

a cap layer covering the gate electrode; and

a spacer located beside the gate dielectric layer, the gate electrode and the cap layer.

5. The non-planar semiconductor structure according to claim 1 , wherein the nitride layer comprises a silicon nitride layer or a silicon oxynitride layer.

6. The non-planar semiconductor structure according to claim 1 , wherein the nitrogen-containing layer is also located between the fin-shaped structures and the epitaxial layers.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 26, 2021
From: UNITED MICROELECTRONICS CORPORATION
To: MARLIN SEMICONDUCTOR LIMITED
Reel/Frame 056991/0292 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 24, 2013
From: TSAI, SHIH-HUNG; LIN, CHIEN-TING; CHIEN, CHIN-CHENG; LIN, CHIN-FU; LIU, CHIH-CHIEN; TSAI, TENG-CHUN; WU, CHUN-YUAN
To: UNITED MICROELECTRONICS CORP.
Reel/Frame 030272/0005 →