Method for forming gate, source, and drain contacts on a MOS transistor
A method for forming gate, source, and drain contacts on a MOS transistor having an insulated gate including polysilicon covered with a metal gate silicide, this gate being surrounded with at least one spacer made of a first insulating material, the method including the steps of a) covering the structure with a second insulating material and leveling the second insulating material to reach the gate silicide; b) oxidizing the gate so that the gate silicide buries and covers the a silicon oxide; c) selectively removing the second insulating material; and d) covering the structure with a first conductive material and leveling the first conductive material all the way to a lower level at the top of the spacer.
1. A method for forming a structure including gate, source, and drain contacts on a MOS transistor having an insulated gate comprising polysilicon covered with a metal gate silicide, this gate being surrounded with at least one spacer made of a first insulating material, the method comprising the steps of:
a) covering the structure with a second insulating material and leveling the second insulating material to reach the gate silicide;
b) oxidizing the gate so that the gate silicide buries and is covered with a silicon oxide;
c) selectively removing the second insulating material; and
d) covering the structure with a first conductive material and leveling the first conductive material all the way to a level lower at the top of said spacer;
wherein, at step a), the second insulating material covering the structure is a silicon oxide, and wherein, at step c), the silicon oxide formed at step b) is also removed.
2. The method of claim 1 , further comprising, after step d) of leveling of the first conductive material, the steps of:
e) covering the structure with a layer of a third insulating material;
f) forming openings in the third insulating material to reach said first conductive material; and
g) filling the openings with a second conductive material.
3. The method of claim 2 , wherein, at step e), the third insulating material covering the structure is of same nature as the second insulating material.
4. The method of claim 2 , wherein, at step g), the second conductive material for filling said openings is of same nature as the first conductive material.
5. The method of claim 2 , wherein the first and second conductive materials are formed of at least one conductive material selected from the group comprising tungsten, copper, titanium nitride, and tantalum nitride.
6. The method of claim 1 , wherein the gate silicide is a silicide based on at least one metal selected from the group comprising nickel, cobalt, palladium, chromium, and platinum.
7. The method of claim 1 , wherein said at least one spacer is a silicon nitride spacer.
8. The method of claim 1 , wherein the gate is formed by deposition of a stack of conductive layers comprising a titanium nitride layer coated with a polysilicon layer and with a metal silicide.
9. The method of claim 1 , wherein, at step b) of oxidation of the gate, the structure is taken to a temperature lower than 700° C., preferably lower than 600° C.
10. The method of claim 1 , wherein the structure is formed on a layer of a first semiconductor material laid on an insulating layer itself laid on a substrate of a second semiconductor material.
11. The method of claim 10 , further comprising, after the forming of the gate and before the forming of the gate silicide, a step at which the epitaxy of the source and drain regions is resumed.
12. The method of claim 11 , wherein, for P-channel MOS transistors, formed in a layer of a first silicon semiconductor material, an epitaxial silicon-germanium layer is formed on the source and drain regions.