Adaptive patterning for panelized packaging
An adaptive patterning method and system for fabricating panel based package structures is described. Misalignment for individual device units in a panel or reticulated wafer may be adjusted for by measuring the position of each individual device unit and forming a unit-specific pattern over each of the respective device units.
1. A method of making a plurality of semiconductor packages, comprising:
forming a panel comprising an encapsulating material disposed around a plurality of semiconductor die;
forming a chip scale build-up structure comprising vias over each of the plurality of semiconductor die comprising a first misalignment relative to each of the plurality of semiconductor die and the vias; and
singulating the plurality of semiconductor die from the panel to form a package outline for each of the plurality of semiconductor die, wherein each package outline comprises a second misalignment relative to each of the plurality of semiconductor die such that a statistical average of the first misalignment between the semiconductor die and vias is less than a statistical average of the second misalignment between the semiconductor die and the package outlines for the plurality of semiconductor die.
2. The method of claim 1 , further comprising forming the plurality of semiconductor die to include a lot of semiconductor die.
3. The method of claim 1 , wherein forming the chip scale build-up structure comprising vias comprising the first misalignment includes forming the first misalignment with a statistical average of zero for each of the plurality of semiconductor die.
4. The method of claim 1 , further including forming the package outlines with the second misalignment with respect to a feature of each of the plurality of semiconductor die.
5. The method of claim 1 , further including forming the chip-scale build-up structure comprising the first misalignment with respect to at least one of a bond pad, a copper pillar and a feature on each of the plurality of semiconductor die.
6. The method of claim 1 , further including measuring misalignments with respect to a point on an edge of the package outlines.
7. The method of claim 1 , further including forming the panel as a reconstituted wafer.
8. A method of making a plurality of semiconductor packages, comprising:
providing a plurality of semiconductor die;
forming package outlines around each of the plurality of semiconductor die having a first misalignment with respect to each of the plurality of semiconductor die; and
forming electrical interconnects over the plurality of semiconductor die having a second misalignment, different from the first misalignment, with respect to each of the plurality of semiconductor die; and
forming the second misalignment with respect to a feature on each of the plurality of semiconductor die.
9. The method of claim 8 , wherein providing the plurality of semiconductor die includes providing a lot of semiconductor die.
10. The method of claim 8 , further including measuring misalignments with respect to a point on an edge of the package outlines.
11. The method of claim 8 , wherein forming the electrical interconnects includes forming conductive vias.
12. The method of claim 8 , wherein forming the first misalignment includes providing the plurality of semiconductor die with a unique statistical range of relative orientations.
13. The method of claim 8 , wherein a statistical average for the first misalignment is not directly proportional to a statistical average of the second misalignment.
14. A plurality of semiconductor packages, comprising:
a plurality of semiconductor die;
a plurality of package outlines disposed around each of the plurality of semiconductor die that have a first misalignment with respect to each of the plurality of semiconductor die; and
a plurality of electrical interconnects disposed over the plurality of semiconductor packages that have a second misalignment, different from the first misalignment, with respect to each of the plurality of semiconductor die;
wherein the first misalignment is formed with respect to each of the plurality of package outlines and an outline of each of the plurality of semiconductor die.
15. The plurality of semiconductor packages of claim 14 , wherein a statistical average of the second misalignment for the plurality of semiconductor die is less than a statistical average of the first misalignment for the plurality of semiconductor die.
16. The plurality of semiconductor packages of claim 14 , wherein the plurality of semiconductor die includes a lot of semiconductor die.
17. The plurality of semiconductor packages of claim 14 , wherein the second misalignment includes a statistical average of zero for each of the plurality of semiconductor die.
18. The plurality of semiconductor packages of claim 14 , wherein the second misalignment is formed with respect to at least one of a bond pad, a copper pillar and a feature on each of the plurality of semiconductor die.
19. The plurality of semiconductor packages of claim 14 , wherein the misalignments are formed with respect to a point on an edge of each of the plurality of package outlines.
20. The plurality of semiconductor packages of claim 14 , wherein the plurality of electrical interconnects include conductive vias.