IP Library Granted Patent US 8,817,534
Granted Patent B2
US 8,817,534 · App. 13/899,177 · Granted Aug 26, 2014

Techniques for providing a semiconductor memory device

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Quick Facts
Patent No.
US 8,817,534
App. No.
13/899,177
Granted
Aug 26, 2014
Kind
B2
Abstract

Techniques for providing a semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus including a first region and a second region. The apparatus may also include a body region disposed between the first region and the second region and capacitively coupled to a plurality of word lines, wherein each of the plurality of word lines is capacitively coupled to different portions of the body region.

Claims (31)

1. A semiconductor memory device comprising:

a first region;

a second region; and

a body region disposed between the first region and the second region and capacitively coupled to a plurality of word lines, wherein each of the plurality of word lines is capacitively coupled to a respective portion of the body region, wherein the body region comprises an undoped semiconductor material.

2. The semiconductor memory device according to claim 1 , wherein the body region is electrically floating.

3. The semiconductor memory device according to claim 2 , wherein the first region comprises an P-doped semiconductor material.

4. The semiconductor memory device according to claim 3 , wherein the second region comprises an N-doped semiconductor material.

5. The semiconductor memory device according to claim 1 , wherein the first region, the second region, and the body region are formed on a substrate.

6. The semiconductor memory device according to claim 5 , wherein the first region, the second region, and the body region are arranged in a planar configuration on the substrate.

7. The semiconductor memory device according to claim 1 , wherein each of the plurality of word lines is capacitively coupled to a respective top portion on a top side of the body region.

8. The semiconductor memory device according to claim 1 , wherein the plurality of word lines further comprise a control word line.

9. The semiconductor memory device according to claim 1 , wherein the plurality of word lines comprise a first word line and a second word line.

10. The semiconductor memory device according to claim 9 , wherein the first word line is capacitively coupled to a first portion of the body region and the second word line is capacitively coupled to a second portion of the body region.

11. The semiconductor memory device according to claim 9 , wherein at least a portion of the first word line overlaps at least a portion of the second word line.

12. The semiconductor memory device according to claim 1 , wherein the first region is coupled to a bit line extending in a first orientation.

13. The semiconductor memory device according to claim 12 , wherein the second region is coupled to a source line extending in the first orientation.

14. The semiconductor memory device according to claim 13 , wherein the plurality of word lines are extending in a second orientation.

15. A semiconductor memory device comprising:

a first region;

a second region; and

a body region disposed between the first region and the second region and capacitively coupled to a plurality of word lines, wherein each of the plurality of word lines is capacitively coupled to a different portion of the body region, wherein a first of the plurality of word lines is formed on a first side of the body region and a second of the plurality of word lines is formed on a second side of the body region, wherein the second side is opposite the first side.

16. The semiconductor memory device according to claim 15 , wherein the body region is electrically floating.

17. The semiconductor memory device according to claim 16 , wherein the body region comprises an undoped semiconductor material.

18. The semiconductor memory device according to claim 17 , wherein the first region comprises an P-doped semiconductor material.

19. The semiconductor memory device according to claim 18 , wherein the second region comprises an N-doped semiconductor material.

20. The semiconductor memory device according to claim 15 , wherein the first region, the body region, the second region are formed in a sequential vertical configuration on a substrate.

21. The semiconductor memory device according to claim 15 , wherein each of the plurality of word lines is capacitively coupled to a respective side portion of the body region.

22. The semiconductor memory device according to claim 15 , wherein the plurality of word lines further comprise a control word line.

23. The semiconductor memory device according to claim 15 , wherein the first region is coupled to a bit line extending in a first orientation.

24. The semiconductor memory device according to claim 23 , wherein the second region is coupled to a source line extending in the first orientation.

25. The semiconductor memory device according to claim 24 , wherein the plurality of word lines are extending in a second orientation.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2016
From: MICRON TECHNOLOGY, INC
To: OVONYX MEMORY TECHNOLOGY, LLC
Reel/Frame 039974/0496 →