IP Library Granted Patent US 9,884,467
Granted Patent B2
US 9,884,467 · App. 13/904,950 · Granted Feb 6, 2018

Copper-based material and method for producing the same

Inventors: Seigi Aoyama (Kita-Ibaraki, JP); Hideyuki Sagawa (Tokaimura, JP); Toru Sumi (Hitachi, JP); Keisuke Fujito (Mito, JP); Hiromitsu Kuroda (Hitachi, JP)
Assignee: HITACHI CABLE, LTD.
B32B15/01C22C9/00C22C9/04C25D5/50C25D7/00C25D3/22Y10T428/12799Y10T428/12903
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Quick Facts
Patent No.
US 9,884,467
App. No.
13/904,950
Granted
Feb 6, 2018
Kind
B2
Abstract

A copper-based material includes a base comprising copper and a surface treatment layer disposed on a surface of the base, the surface treatment layer including an amorphous layer containing a metal element that has a greater affinity for oxygen than for copper, oxygen, and, optionally, copper diffused from the base.

Claims (15)

1. A copper-based material, comprising:

a base comprising oxygen-free copper, tough pitch copper, or dilute copper alloys containing 3 ppm to 15 ppm by mass of sulfur, 2 ppm to 30 ppm by mass of oxygen, and 5 ppm to 55 ppm by mass of Ti; and

a surface treatment layer directly disposed on an entirety of a surface of the base, the surface treatment layer consisting of an amorphous layer comprising oxygen and a metal having a higher oxygen affinity than copper, the metal consisting of zinc and a diffusion layer between the amorphous layer and the base, the diffusion layer comprising copper and zinc, or a diffusion layer comprising copper, zinc and oxygen.

2. The copper-based material according to claim 1 , wherein the surface treatment layer has a thickness of 3.0 nm to 0.6 μm.

3. The copper-based material according to claim 1 , wherein the diffusion layer has a thickness of 0.5 μm or less.

4. The copper-based material according to claim 1 , wherein the surface treatment layer is formed in a heat treatment at a temperature of 50° C. to 150° C. for 30 seconds to 60 minutes.

5. The copper-based material according to claim 4 , wherein the surface treatment layer has a thickness in a range of 3.0 nm to 0.6 μm.

6. The copper-based. material according to claim 4 , wherein the heat treatment is performed in a range of 30 seconds to 60 minutes.

7. The copper-based material according to claim 1 , wherein the surface treatment layer has a thickness of 3.0 nm to 0.5 μm.

8. The copper-based material according to claim 1 , wherein the base comprises the oxygen-free copper.

9. The copper-based material according to claim 1 , wherein the base comprises the dilute copper alloys.

10. The copper-based material according to claim 1 , wherein the amorphous layer further comprises copper diffused from the base into the amorphous layer.

11. A copper-based material, comprising:

a base comprising copper; and

a surface treatment layer directly disposed on an entirety of a surface of the base, the surface treatment layer consisting of an amorphous layer comprising oxygen and a metal having a higher oxygen affinity than copper, the metal consisting of zinc and a diffusion layer between the amorphous layer and the base, the diffusion layer comprising copper and zinc, or a diffusion layer comprising copper, zinc and oxygen.

Assignments (2)
MERGER Recorded Dec 21, 2017
From: HITACHI CABLE, LTD.
To: HITACHI METALS, LTD.
Reel/Frame 044946/0813 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 31, 2013
From: SAGAWA, HIDEYUKI; AOYAMA, SEIGI; SUMI, TORU; FUJITO, KEISUKE; KURODA, HIROMITSU
To: HITACHI CABLE, LTD.
Reel/Frame 030583/0156 →
Priority Claims (1)
JP 2012-125861 · Jun 1, 2012 · national
Continuity (1)
Related Publication 20130323532A1 · Dec 5, 2013