Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern
A method of producing an ammonium salt compound, including reacting a first ammonium salt compound containing a first ammonium cation which is a primary, secondary or tertiary ammonium cation with a nitrogen-containing compound having a lone pair to obtain a second ammonium salt compound which contains a conjugated acid of the nitrogen-containing compound, the conjugated acid of the nitrogen-containing compound having a larger pKa than the pKa of the first ammonium cation; and a method of producing a compound, including a step of salt exchange between the ammonium salt compound obtained by the aforementioned production method and a sulfonium cation or iodonium cation which has a higher hydrophobicity than the hydrophobicity of the conjugated acid of the nitrogen-containing compound.
1. A method of producing an ammonium salt compound, comprising reacting a first ammonium salt compound containing a first ammonium cation which is a primary, secondary or tertiary ammonium cation with a nitrogen-containing compound having a lone pair to obtain a second ammonium salt compound which contains a conjugated acid of the nitrogen-containing compound, the conjugated acid of the nitrogen-containing compound having a larger pKa than the pKa of the first ammonium cation.
2. The method of producing an ammonium salt compound according to claim 1 , wherein the conjugated acid of the nitrogen-containing compound has a lower hydrophobicity than the hydrophobicity of the first ammonium cation.
3. The method of producing an ammonium salt compound according to claim 1 , wherein the first ammonium salt compound is obtainable by conducting salt exchange between the first ammonium cation and a compound (P) containing a cation which has a lower hydrophobicity than the hydrophobicity of the first ammonium cation.
4. The method of producing an ammonium salt compound according to claim 3 , wherein the first ammonium salt compound is obtainable by conducting salt exchange between the first ammonium cation and the compound (P), and conducting washing treatment.
5. The method of producing an ammonium salt compound according to claim 3 , wherein the compound (P) is a salt containing an organic anion and the cation which has a lower hydrophobicity than the hydrophobicity of the first ammonium cation.
6. The method of producing an ammonium salt compound according to claim 5 , wherein the organic anion is a sulfonate anion, an amide anion, a methide anion or a carboxylate anion.
7. A method of producing a compound, comprising:
a step of reacting a first ammonium salt compound containing a first ammonium cation which is a primary, secondary or tertiary ammonium cation with a nitrogen-containing compound having a lone pair to obtain a second ammonium salt compound which contains a conjugated acid of the nitrogen-containing compound, the conjugated acid of the nitrogen-containing compound having a larger pKa than the pKa of the first ammonium cation; and
a step of conducting salt exchange between the second ammonium salt compound and a sulfonium cation or iodonium cation which has a higher hydrophobicity than the hydrophobicity of the conjugated acid of the nitrogen-containing compound.
8. The method of producing a compound according to claim 7 , wherein the conjugated acid of the nitrogen-containing compound has a lower hydrophobicity than the hydrophobicity of the first ammonium cation.
9. The method of producing a compound according to claim 7 , wherein the first ammonium salt compound is obtainable by conducting salt exchange between the first ammonium cation and a compound (P) containing a cation which has a lower hydrophobicity than the hydrophobicity of the first ammonium cation.
10. The method of producing a compound according to claim 9 , wherein the first ammonium salt compound is obtainable by conducting salt exchange between the first ammonium cation and the compound (P), and conducting washing treatment.
11. The method of producing a compound according to claim 9 , wherein the compound (P) is a salt containing an organic anion and a cation which has a lower hydrophobicity than the hydrophobicity of the first ammonium cation.
12. The method of producing a compound according to claim 11 , wherein the organic anion is a sulfonate anion, an amide anion, a methide anion or a carboxylate anion.
13. A compound produced by the method of producing a compound of claim 7 .
14. The compound according to claim 13 , which contains a polymerizable group.
15. A polymeric compound comprising a structural unit derived from the compound of claim 14 .
16. An acid generator comprising the compound of claim 13 .
17. A resist composition comprising the acid generator of claim 16 .
18. A resist composition comprising the polymeric compound of claim 15 .
19. A method of forming a resist pattern, comprising: forming a resist film on a substrate using a resist composition of claim 17 ; conducting exposure of the resist film; and developing the resist film to form a resist pattern.