Stacked layers of nitride semiconductor and method for manufacturing the same
View Patent ↗According to one embodiment, stacked layers of a nitride semiconductor include a substrate, a single crystal layer and a nitride semiconductor layer. The substrate does not include a nitride semiconductor and has a protrusion on a major surface. The single crystal layer is provided directly on the major surface of the substrate to cover the protrusion, and includes a crack therein. The nitride semiconductor layer is provided on the single crystal layer.
1. A method for manufacturing a semiconductor light emitting device, comprising:
forming a plurality of protrusions on a major surface of a substrate, the substrate not including a nitride semiconductor; forming a single crystal layer directly on the major surface of the substrate to cover the protrusions and to cause a crack in the single crystal layer; and forming a nitride semiconductor layer on the single crystal layer, the plurality of the protrusions being formed in a planar pattern, the protrusions extending in a prescribed crystal orientation of the substrate, and extending in a plurality of directions equivalent to the prescribed crystal orientation.
2. The method of claim 1 , wherein the crack exists on a boundary between a top surface of the protrusion and a tilted side surface of the protrusion, or a boundary between the major surface of the substrate and the tilted side surface of the protrusion.
3. The method of claim 1 , wherein the crack exists on at least one of a top portion of a side surface of the protrusion and lower portion of the side surface of the protrusion.
4. The method of claim 1 , wherein the plurality of the protrusions are formed in a stripe pattern, and the crack extend along the one of the protrusions.
5. The method of claim 1 , wherein the substrate is a sapphire substrate or a silicon substrate.
6. A method for manufacturing a semiconductor light emitting device, comprising:
forming a plurality of protrusions on a major surface of a substrate, the substrate not including a nitride semiconductor; forming a single crystal layer directly on the major surface of the substrate to cover the protrusions and to cause a crack in the single crystal layer; and forming a nitride semiconductor layer on the single crystal layer, the plurality of the protrusions being formed in an island-like pattern, the plurality of the island-like protrusions being arranged in a prescribed crystal orientation of the substrate, and the plurality of the island-like protrusions being arranged in a plurality of directions equivalent to prescribed crystal orientation.
7. The method of claim 6 , wherein the crack exists on a boundary between a top surface of the protrusion and a tilted side surface of the protrusion, or a boundary between the major surface of the substrate and the tilted side surface of the protrusion.
8. The method of claim 6 , wherein the crack exists on at least one of a top portion of a side surface of the protrusion and lower portion of the side surface of the protrusion.
9. The method of claim 6 , wherein the substrate is a sapphire substrate or a silicon substrate.
10. A method for manufacturing a semiconductor light emitting device, comprising:
forming a protrusion on a major surface of a substrate, the substrate not including a nitride semiconductor;
forming a single crystal layer directly on the major surface of the substrate to cover the protrusion and to cause a crack in the single crystal layer, the single crystal layer being an Al x Ga 1-x N(0.8<x<1) layer; and
forming a nitride semiconductor layer on the single crystal layer.
11. The method of claim 10 , wherein the crack exists on a boundary between a top surface of the protrusion and a tilted side surface of the protrusion, or a boundary between the major surface of the substrate and the tilted side surface of the protrusion.
12. The method of claim 10 , wherein the crack exists on at least one of a top portion of a side surface of the protrusion and lower portion of the side surface of the protrusion.
13. The method of claim 10 , wherein a plurality of the protrusions are formed in a stripe pattern, and the crack extend along the one of the protrusions.
14. The method of claim 10 , wherein the single crystal layer includes an AlN layer.
15. The method of claim 10 , wherein the substrate is a sapphire substrate or a silicon substrate.
16. A method for manufacturing a semiconductor light emitting device, comprising:
forming a protrusion on a major surface of a substrate, the substrate not including a nitride semiconductor; forming a single crystal layer directly on the major surface of the substrate to cover the protrusion and to cause a crack in the single crystal layer; and forming a nitride semiconductor layer on the single crystal layer, the nitride semiconductor layer including an undoped layer provided directly on the single crystal layer.
17. The method of claim 16 , wherein the crack exists on a boundary between a top surface of the protrusion and a tilted side surface of the protrusion, or a boundary between the major surface of the substrate and the tilted side surface of the protrusion.
18. The method of claim 16 , wherein the crack exists on at least one of a top portion of a side surface of the protrusion and lower portion of the side surface of the protrusion.
19. The method of claim 16 , wherein a plurality of the protrusions are formed in a stripe pattern, and the crack extend along the one of the protrusions.
20. The method of claim 16 , wherein the substrate is a sapphire substrate or a silicon substrate.