IP Library Granted Patent US 9,169,974
Granted Patent B2
US 9,169,974 · App. 13/949,018 · Granted Oct 27, 2015

Multiple-cavity vapor cell structure for micro-fabricated atomic clocks, magnetometers, and other devices

Inventors: Roozbeh Parsa (San Jose, CA); Peter J. Hopper (San Jose, CA); William French (San Jose, CA)
Assignee: TEXAS INSTRUMENTS INCORPORATED
F17C3/00F17C13/00G04F5/14G21K5/08H03L7/26
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Quick Facts
Patent No.
US 9,169,974
App. No.
13/949,018
Granted
Oct 27, 2015
Kind
B2
Abstract

An apparatus includes a vapor cell having multiple cavities fluidly connected by one or more channels. At least one of the cavities is configured to receive a first material able to dissociate into one or more gases that are contained within the vapor cell. At least one of the cavities is configured to receive a second material able to absorb at least a portion of the one or more gases. The vapor cell could include a first cavity configured to receive the first material and a second cavity fluidly connected to the first cavity by at least one first channel, where the second cavity is configured to receive the gas(es). The vapor cell could also include a third cavity fluidly connected to at least one of the first and second cavities by at least one second channel, where the third cavity is configured to receive the second material.

Claims (33)

1. An apparatus comprising:

a vapor cell having:

a first cavity configured to receive a first material;

a second cavity fluidly connected to the first cavity by a first channel, the second cavity configured to receive one or more gases dissociated from the first material and allow radiation to pass through; and

a third cavity fluidly connected to one of the first cavity or the second cavity by a second channel, the third cavity configured to receive a second material for absorbing a portion of the one or more gases dissociated from the first material.

2. The apparatus of claim 1 , wherein the vapor cell includes a first wafer defining the first, second, and third cavities and the first and second channels.

3. The apparatus of claim 2 , wherein the vapor cell includes a second wafer secured to the first wafer, the second wafer sealing ends of the first, second, and third cavities and the first and second channels.

4. The apparatus of claim 2 , wherein the vapor cell includes a second wafer secured to the first wafer, the second wafer thinner than the first wafer at a location proximate to the first cavity.

5. The apparatus of claim 1 , wherein:

the first material comprises an alkali-based material able to dissociate into a metal vapor and a buffer gas; and

the second material comprises a getter material able to absorb at least a portion of the buffer gas.

6. The apparatus of claim 5 , wherein:

the first material comprises cesium azide (CsN 3 ) able to dissociate into cesium vapor and nitrogen gas (N 2 ); and

the second material comprises a zirconium-based alloy.

7. A system comprising:

a vapor cell including:

a first cavity configured to receive a first material;

a second cavity fluidly connected to the first cavity by a first channel, the second cavity configured to receive one or more gases dissociated from the first material and allow radiation to pass through; and

a third cavity fluidly connected to one of the first cavity or the second cavity by a second channel, the third cavity configured to receive a second material for absorbing a portion of the one or more gases dissociated from the first material; and

an illumination source configured to direct radiation through at least one of the first, second, or third cavity.

8. The system of claim 7 , wherein the vapor cell includes a first wafer defining the first, second, and third cavities and the first and second channels.

9. The system of claim 8 , wherein the vapor cell includes a second wafer secured to the first wafer, the second wafer sealing ends of the first, second, and third cavities and the first and second channels.

10. The system of claim 8 , wherein the vapor cell includes a second wafer secured to the first wafer, the second wafer thinner than the first wafer at a location proximate to the first cavity.

11. The system of claim 7 , further comprising:

a clock generation circuitry configured to generate a clock signal based on the radiation directed through the second cavity.

12. The system of claim 7 , further comprising:

a magnetic field calculator configured to determine a measurement of a magnetic field through the vapor cell based on the radiation directed through the second cavity.

13. A method for use in a vapor cell having multiple cavities fluidly connected by one or more channels, the method comprising:

placing a first material into a first cavity of a first wafer before the first cavity is sealed;

placing onto a second wafer a second material including a getter material;

securing the second wafer to the first wafer to partially seal the first cavity and at a temperature that activates the getter material;

dissociating a portion of the first material into one or more gases that are contained within the vapor cell; and

absorbing a portion of the one or more gases using the second material.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 24, 2013
From: PARSA, ROOZBEH; HOPPER, PETER J.; FRENCH, WILLIAM
To: TEXAS INSTRUMENTS INCORPORATED
Reel/Frame 030891/0050 →
Continuity (1)
Related Publication 20150027908A1 · Jan 29, 2015