Resistor thin film MTP memory
View Patent ↗An integrated circuit is formed having an array of memory cells located in the dielectric stack above a semiconductor substrate. Each memory cell has two adjustable resistors and two heating elements. A dielectric material separates the heating elements from the adjustable resistors. One heating element alters the resistance of one of the resistors by applying heat thereto to write data to the memory cell. The other heating element alters the resistance of the other resistor by applying heat thereto to erase data from the memory cell.
1. A memory device comprising:
a data writing circuit; and
a plurality of memory cells, each memory cell including:
a first thin film adjustable resistor;
a second thin film adjustable resistor;
a first thin film heating element adjacent the first thin film adjustable resistor and coupled to the data writing circuit, the first thin film heating element configured to alter the resistance of the first thin film adjustable resistor by heating the first thin film adjustable resistor;
a second thin film heating element adjacent the second thin film adjustable resistor and coupled to the data writing circuit, the second thin film heating element configured to alter the resistance of the second thin film adjustable resistor by heating the second thin film adjustable resistor; and
a dielectric layer separating the first thin film heating element from the first thin film adjustable resistor and separating the second thin film heating element from the second thin film adjustable resistor.
2. The memory device of claim 1 comprising an integrated circuit die, the memory cells being formed in the integrated circuit die.
3. The memory device of claim 2 comprising transistors in the integrated circuit die.
4. The memory device of claim 1 wherein the first and second thin film adjustable resistors are chromium silicon thin film adjustable resistors.
5. The memory device of claim 1 wherein the first and second thin film heating elements are formed of tantalum.