Method for producing group III nitride crystal
A method for producing a Group III nitride crystal includes the steps of cutting a plurality of Group III nitride crystal substrates 10 p and 10 q having a major surface from a Group III nitride bulk crystal 1 , the major surfaces 10 pm and 10 qm having a plane orientation with an off-angle of five degrees or less with respect to a crystal-geometrically equivalent plane orientation selected from the group consisting of {20−21}, {20−2−1}, {22−41}, and {22−4−1}, transversely arranging the substrates 10 p and 10 q adjacent to each other such that the major surfaces 10 pm and 10 qm of the substrates 10 p and 10 q are parallel to each other and each [0001] direction of the substrates 10 p and 10 q coincides with each other, and growing a Group III nitride crystal 20 on the major surfaces 10 pm and 10 qm of the substrates 10 p and 10 q.
1. A Group III nitride crystal satisfying:
a main plane of plane orientation being any one of {20-21}, {20-2-1}, {22-41}, and {22-4-1}; and
at least one of either
a hydrogen-atom concentration of between 6×10 16 cm −3 and 1×10 18 cm −3 inclusive, and
a carbon-atom concentration of between 1×10 16 cm −3 and 1×10 18 cm −3 inclusive.
2. A Group III nitride crystal recited in claim 1 , satisfying at least one of either:
a hydrogen-atom concentration of between 1×10 17 cm −3 and 9×10 17 cm −3 inclusive; and
a carbon-atom concentration of between 5×10 16 cm −3 and 9×10 17 cm −3 inclusive.
3. A Group III nitride crystal recited in claim 1 , satisfying at least one of either:
a hydrogen-atom concentration of between 2×10 17 cm −3 and 7×10 17 cm −3 inclusive; and
a carbon-atom concentration of between 9×10 16 cm −3 and 7×10 17 cm −3 inclusive.