IP Library Granted Patent US 8,792,276
Granted Patent B2
US 8,792,276 · App. 13/964,777 · Granted Jul 29, 2014

Semiconductor device with floating gate and electrically floating body

Inventor: Serguei Okhonin (Lausanne, CH)
Assignee: Micron Technology, Inc.
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Quick Facts
Patent No.
US 8,792,276
App. No.
13/964,777
Granted
Jul 29, 2014
Kind
B2
Abstract

Techniques for providing floating body memory devices are disclosed. In one particular exemplary embodiment, the techniques may be realized as a semiconductor device comprising a floating gate, a control gate disposed over the floating gate, a body region that is electrically floating, wherein the body region is configured so that material forming the body region is contained under at least one lateral boundary of the floating gate, and a source region and a drain region adjacent the body region.

Claims (34)

1. A semiconductor device comprising:

a body region, wherein the body region is electrically floating;

a gate disposed over a first portion of the body region, wherein the gate is electrically floating;

a source region adjoining the first portion of the body region; and

a drain region adjoining a second portion of the body region, the second portion adjacent the first portion and separating the drain region from the first portion.

2. The device of claim 1 , wherein the floating gate is separated from the body region by a dielectric.

3. The device of claim 2 , further comprising a control gate disposed over the floating gate.

4. The device of claim 3 , wherein the control gate is separated from the floating gate by a dielectric.

5. The device of claim 4 , further comprising circuitry to apply a first signal set including a first potential difference coupled between the source region and the drain region and a first gate signal coupled to the control gate, wherein the first signal set programs a first logic state in the floating gate.

6. The device of claim 5 , further comprising circuitry to apply a second signal set including a second potential difference coupled between the source region and the drain region and a second gate signal coupled to the control gate, wherein the second signal set programs a second logic state in the floating gate.

7. The device of claim 6 , further comprising circuitry to apply a third signal set including a third potential difference coupled between the source region and the drain region and a third gate signal coupled to the control gate, wherein the third signal set reads a logic state in the floating gate.

8. The device of claim 7 , further comprising circuitry to apply a fourth signal set including a fourth potential difference coupled between the source region and the drain region and a fourth gate signal coupled to the control gate, wherein the fourth signal set programs a logic state in the body region.

9. The device of claim 8 , further comprising circuitry to apply a fifth signal set including a fifth potential difference coupled between the source region and the drain region and a fifth gate signal coupled to the control gate, wherein the fifth signal set reads a logic state in the body region.

10. The device of claim 1 , wherein the body region includes a first type of semiconductor material.

11. The device of claim 10 , wherein the source region and drain region include a second type of semiconductor material.

12. The device of claim 11 , wherein the source region includes one or more of a lightly doped region and a highly doped region.

13. The device of claim 11 , wherein the drain region includes one or more of a lightly doped region and a highly doped region.

14. A semiconductor device comprising:

a body region, wherein the body region is electrically floating;

a gate disposed over a first portion of the body region, wherein the gate is electrically floating;

a drain region adjoining the first portion of the body region; and

a source region adjoining a second portion of the body region, the second portion adjacent the first portion and separating the source region from the first portion.

15. The device of claim 14 , wherein the floating gate is separated from the body region by a dielectric.

16. The device of claim 15 , further comprising a control gate disposed over the floating gate.

17. The device of claim 16 , wherein the control gate is separated from the floating gate by a dielectric.

18. The device of claim 17 , further comprising circuitry to apply a first signal set including a first potential difference coupled between the source region and the drain region and a first gate signal coupled to the control gate, wherein the first signal set programs a first logic state in the floating gate.

19. The device of claim 18 , further comprising circuitry to apply a second signal set including a second potential difference coupled between the source region and the drain region and a second gate signal coupled to the control gate, wherein the second signal set programs a second logic state in the floating gate.

20. The device of claim 19 , further comprising circuitry to apply a third signal set including a third potential difference coupled between the source region and the drain region and a third gate signal coupled to the control gate, wherein the third signal set reads a logic state in the floating gate.

21. The device of claim 20 , further comprising circuitry to apply a fourth signal set including a fourth potential difference coupled between the source region and the drain region and a fourth gate signal coupled to the control gate, wherein the fourth signal set programs a logic state in the body region.

22. The device of claim 21 , further comprising circuitry to apply a fifth signal set including a fifth potential difference coupled between the source region and the drain region and a fifth gate signal coupled to the control gate, wherein the fifth signal set reads a logic state in the body region.

23. The device of claim 14 , wherein the body region includes a first type of semiconductor material.

24. The device of claim 23 , wherein the source region and drain region include a second type of semiconductor material.

25. The device of claim 24 , wherein the source region includes one or more of a lightly doped region and a highly doped region.

26. The device of claim 24 , wherein the drain region includes one or more of a lightly doped region and a highly doped region.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2016
From: MICRON TECHNOLOGY, INC
To: OVONYX MEMORY TECHNOLOGY, LLC
Reel/Frame 039974/0496 →
Continuity (3)
Continuation 12770249 · Apr 29, 2010
Provisional Application 61174075 · Apr 30, 2009
Related Publication 20130329501A1 · Dec 12, 2013