Sample holder of electron beam exposure apparatus and electron beam exposure method using the same

1. A sample holder to be disposed between an electrostatic chuck and a sample being smaller than an upper surface of the electrostatic chuck, comprising:

a base plate formed in the same size as the upper surface of the electrostatic chuck;

a sample placement portion located on an upper surface of the base plate, and designed to place the sample thereon; and

a circumferential portion being a portion of the upper surface of the base plate other than the sample placement portion, and having a conductive material exposed to an outside.

2. The sample holder according to claim 1 , wherein the sample placement portion includes a first electrode electrically insulated from the conductive material exposed to the outside in the circumferential portion.

3. The sample holder according to claim 2 , wherein the sample placement portion includes an insulating member covering the first electrode.

4. The sample holder according to claim 3 , wherein

the sample is made of a conductor or a semiconductor, and

the first electrode generates electrostatic attraction force between itself and the sample by causing electrostatic polarization in the sample.

5. The sample holder according to claim 4 , wherein

the base plate is made of a conductor or a semiconductor, and

the first electrode is formed on an insulating film formed on the base plate.

6. The sample holder according to claim 4 , wherein

the base plate is made of an insulating material, and

the first electrode is formed on the base plate.

7. The sample holder according to claim 6 , wherein

the circumferential portion is covered with an antistatic film made of a conductive material and formed isolated from the first electrode.

8. The sample holder according to claim 6 , wherein the sample holder includes a second electrode located on a back surface of the base plate and electrically insulated from the first electrode.

9. The sample holder according to claim 1 , wherein the sample holder includes a positioning member located around the sample placement portion and configured to position the sample on the sample placement portion.

10. An electron beam exposure method using a sample holder including:

a base plate formed in the same size as an upper surface of an electrostatic chuck;

a sample placement portion being located on an upper surface of the base plate, and designed to place a sample thereon; and

a circumferential portion being a portion of the upper surface of the base plate other than the sample placement portion, and having a conductive material exposed to an outside, the method comprising the steps of:

placing the sample on the sample holder;

disposing the sample holder with the sample placed thereon on the electrostatic chuck, and fixing the sample holder on the electrostatic chuck by applying a voltage to the electrostatic chuck; and

carrying out pattern lithography by irradiating the sample disposed on the electrostatic chuck with an electron beam.

11. The electron beam exposure method according to claim 10 , wherein

the sample holder further includes a first electrode electrically insulated from the conductive material exposed to the outside in the circumferential portion, and

after the step of placing the sample on the sample holder, the method includes the steps of:

applying a voltage to the first electrode and thereby generating electrostatic attraction force between the first electrode and the sample, and

conveying the sample holder onto the electrostatic chuck while keeping the attraction state between the first electrode and the sample with electric charges remaining therebetween.