IP Library Granted Patent US 8,999,810
Granted Patent B2
US 8,999,810 · App. 13/970,028 · Granted Apr 7, 2015

Method of making a stacked microelectronic package

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Quick Facts
Patent No.
US 8,999,810
App. No.
13/970,028
Granted
Apr 7, 2015
Kind
B2
Abstract

A method of making a stacked microelectronic package by forming a microelectronic assembly by stacking a first subassembly including a plurality of microelectronic elements onto a second subassembly including a plurality of microelectronic elements, at least some of the plurality of microelectronic elements of said first subassembly and said second subassembly having traces that extend to respective edges of the microelectronic elements, then forming notches in the microelectronic assembly so as to expose the traces of at least some of the plurality of microelectronic elements, then forming leads at the side walls of the notches, the leads being in electrical communication with at least some of the traces and dicing the assembly into packages. Additional embodiments include methods for creating stacked packages using substrates and having additional traces that extend to both the top and bottom of the package.

Claims (22)

1. A method of manufacturing a stacked package comprising the steps of:

aligning saw lanes of a first wafer with saw lanes of a second wafer such that the saw lanes of the first wafer are positioned above the saw lanes of the second wafer, each of the first and second wafers having first and second microelectronic elements adjacent to and separated by a first saw lane of the saw lanes in a direction transverse to the first saw lane, each of the first and second microelectronic elements of each of the first and second wafers having at least a first trace extending therefrom towards the saw lanes;

exposing at least the first traces of each of the first and second microelectronic elements of each of the first and second wafers by at least partially cutting through the aligned first saw lane of the first wafer and second wafer; and

forming a lead in contact with at least the exposed first traces of each of the first and second microelectronic elements of each of the first and second wafers; and

severing the first and second wafers to form first and second individual stacked packages, each of the first and second individual stacked packages including portions of each of the first and second wafers, such that a first portion of the lead is in contact with and in electrical communication with the first traces of each of the first and second wafers of the first individual stacked package and a second portion of the lead is in contact with and in electrical communication with the first traces of each of the first and second wafers of the second individual stacked package.

2. The method of claim 1 , wherein the first and second wafers include a plurality of microelectronic elements in electrical contact with the plurality of traces.

3. The method of claim 2 , further comprising attaching the first wafer to the second wafer after the saw lanes of the two wafers are aligned.

4. The method of claim 2 , wherein the leads include first ends that extend to a front face of one of the wafers.

5. The method of claim 4 , further comprising providing solder bumps at the first ends of the leads for attaching to an additional microelectronic device.

6. The method of claim 1 , further comprising aligning the saw lanes of at least one additional wafer with the saw lanes of the first and second wafers, wherein during the step of exposing the plurality of traces of the first and second wafer a plurality of traces of the at least one additional wafer is also exposed.

7. A method of making a stacked microelectronic package, the method comprising the steps of:

forming a microelectronic assembly by stacking a first subassembly having saw lanes and including a plurality of microelectronic elements onto a substrate having saw lanes such that the saw lanes of the first subassembly are aligned with the saw lanes of the substrate, stacking a second subassembly having saw lanes and including a plurality of microelectronic elements above said first subassembly such that the saw lanes of the second subassembly are aligned with the saw lanes of the first subassembly, at least some of the plurality of microelectronic elements of said first subassembly and said second subassembly having traces that extend to respective edges of the microelectronic elements;

forming notches in the microelectronic assembly at the saw lanes of the respective subassemblies so as to expose the traces of at least some of the plurality of microelectronic elements; and

forming leads at the side walls of the notches, the leads being in electrical communication with at least some of the traces.

8. The method of claim 7 , wherein a relief channel, aligned with the saw lanes of the substrate, extends partially through the substrate.

9. The method of claim 7 , wherein the leads include first ends that extend to an upper face of the second subassembly.

10. The method of claim 9 , wherein the leads include second ends that extend to an upper face of the substrates.

11. The method of claim 8 , wherein the forming of notches does not include forming notches in the substrate.

12. The method of claim 7 , further comprising dicing through the saw lanes of the substrate to form individual stacked packages.

13. The method of claim 7 , wherein during the forming of the microelectronic assembly, a first face of the first subassembly is adhered to a second face of the substrate by an adhesive.

14. The method of claim 7 , wherein at least some of the plurality of microelectronic elements of said first subassembly and said second subassembly have traces that extend across said saw lanes of said first subassembly and said second subassembly.

15. The method of claim 7 , wherein the forming of notches includes forming initial notches in at least said first subassembly so as to expose said traces and filling said initial notches with adhesive so as to cover said traces, forming initial notches in at least said second subassembly so as to expose said traces and filling said initial notches with adhesive so as to cover said traces, and forming said notches in said adhesive so as to expose the traces of at least some of the plurality of microelectronic elements.

Assignments (6)
CHANGE OF NAME Recorded Nov 21, 2025
From: TESSERA, INC.
To: TESSERA LLC
Reel/Frame 073657/0979 →
CHANGE OF NAME Recorded Nov 21, 2025
From: TESSERA LLC
To: ADEIA SEMICONDUCTOR SOLUTIONS LLC
Reel/Frame 073658/0661 →
RELEASE OF SECURITY INTEREST Recorded Jun 11, 2020
From: ROYAL BANK OF CANADA
To: TESSERA, INC.; INVENSAS BONDING TECHNOLOGIES, INC. (F/K/A ZIPTRONIX, INC.); FOTONATION CORPORATION (F/K/A DIGITALOPTICS CORPORATION AND F/K/A DIGITALOPTICS CORPORATION MEMS); INVENSAS CORPORATION; TESSERA ADVANCED TECHNOLOGIES, INC; DTS, INC.; DTS LLC; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
Reel/Frame 052920/0001 →
SECURITY INTEREST Recorded Jun 1, 2020
From: ROVI SOLUTIONS CORPORATION; ROVI TECHNOLOGIES CORPORATION; ROVI GUIDES, INC.; TIVO SOLUTIONS INC.; VEVEO, INC.; INVENSAS CORPORATION; INVENSAS BONDING TECHNOLOGIES, INC.; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: BANK OF AMERICA, N.A.
Reel/Frame 053468/0001 →
SECURITY INTEREST Recorded Dec 2, 2016
From: INVENSAS CORPORATION; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; ZIPTRONIX, INC.; DIGITALOPTICS CORPORATION; DIGITALOPTICS CORPORATION MEMS; DTS, LLC; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: ROYAL BANK OF CANADA, AS COLLATERAL AGENT
Reel/Frame 040797/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 14, 2014
From: HABA, BELGACEM; OGANESIAN, VAGE
To: TESSERA, INC.
Reel/Frame 034174/0650 →