Method for producing a reflective optical component for an EUV projection exposure apparatus and component of this type
View Patent ↗A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.
1. A method, comprising:
working an optically operative microstructuring into an initial substrate to provide a microstructured substrate;
applying a polishing layer to the microstructured substrate;
polishing the polishing layer to provide a polished, polishing layer having a surface with a roughness of less than 0.2 nanometer rms; and
applying a reflective layer to the polished, polishing layer,
wherein:
the reflective layer has a surface roughness of less than 0.2 nanometer rms; and
the reflective layer is configured to reflect EUV radiation.
2. The method of claim 1 , wherein the initial substrate comprises a material selected from the group consisting of metals, metal alloys, semiconductors and the compounds thereof.
3. The method of claim 1 , wherein the initial substrate comprises a polymeric material.
4. The method of claim 1 , wherein the initial substrate further comprises a base body and an adhesion promoting material is between the base body and the polishing layer.
5. The method of claim 1 , wherein:
the polishing layer comprises a material that is harder than the microstructured substrate.
6. The method of claim 1 , further comprising, after applying the reflective layer to the polished, polishing layer, providing a protective layer which is supported by the reflective layer.
7. A component, comprising:
a substrate comprising an optically operative microstructuring;
a polishing layer supported by the optically operative microstructuring, the polishing layer having a surface with a roughness of less than 0.2 nanometer rms; and
a reflective layer supported by the surface of the polishing layer,
wherein a surface of the reflective layer has a roughness of less than 0.2 nanometer rms, and the reflective layer is configured to reflect EUV radiation.
8. The component of claim 7 , wherein the initial substrate comprises a material selected from the group consisting of metals, metal alloys, semi-conductors and the compounds thereof.
9. The component of claim 7 , wherein the base body comprises a polymeric material.
10. The component of claim 7 , wherein the polishing layer comprises a material that is softer than the substrate.
11. The component of claim 7 , wherein the polishing layer is harder than the substrate.
12. The component of claim 7 , further comprising a protective material supported by the reflective layer.
13. The component of claim 7 , wherein the optically operative microstructuring is a wavelength-selective filter.
14. The component of claim 7 , wherein the optically operative microstructuring is a diffraction grating comprising ribs and grooves in alternating fashion, each rib and each groove having a surface substantially parallel to a light entrance surface of the component, and the ribs and the grooves having flanks substantially parallel to an optical axis of the component.
15. The component of claim 7 , wherein a grating constant locally varies over the diffraction grating.
16. The component of claim 7 , wherein the component is a collector mirror.