Charged particle beam device, and image analysis device
View Patent ↗In a scanning electron microscope, if a failure is caused to occur in a SEM image by the influence of a disturbance such as magnetic field or vibration inside and from outside the device, the cause is identified simply and accurately using this SEM image. There is provided a measurement technique whose measurement accuracy is not influenced by a roughness of SEM image pattern. A one-dimensional scanning is performed in a scanning-line direction (X direction) by setting the Y-direction scanning gain at zero at the time of acquiring the SEM image, and a two-dimensional image is created by arranging image information, which is obtained by the scanning, in a time-series manner in the Y direction. A shift-amount data on the two-dimensional image is acquired using a correlation function, and the magnetic field or vibration included within the SEM image is measured by a frequency analysis of the data.
1. A charged-particle beam device, comprising:
a charged-particle source;
a deflector which performs a scanning with a beam, said beam being emitted from said charged-particle source; and
an image formation unit which forms an image on the basis of charged particles emitted from a sample, wherein
said image formation unit forms a two-dimensional image by expanding signals in a two-dimensional manner, said signals being obtained when said deflector performs said scanning with said beam in a one-dimensional manner and in plural times.
2. The charged-particle beam device according to claim 1 , further comprising:
a signal analysis unit which applies a frequency analysis to waveform information indicating edge of said two-dimensional image.
3. The charged-particle beam device according to claim 2 , wherein
said signal analysis unit detects a signal amount for each frequency component that is obtained based on said frequency analysis.
4. The charged-particle beam device according to claim 2 , further comprising:
an output-data creation unit which outputs information about a frequency-analysis result when said frequency-analysis result becomes a predetermined condition, said frequency-analysis result being obtained by said signal analysis unit.
5. The charged-particle beam device according to claim 2 , wherein
said signal analysis unit outputs noise-related information which is memorized in a manner that an obtained frequency-analysis result is related with frequency components obtained by making reference to a database registered in advance.
6. The charged-particle beam device according to claim 1 , wherein
said image formation unit forms at least two two-dimensional images on the basis of charged particles, said charged particles being detected by said deflector's performing said scanning with said beam in two different directions and in a one-dimensional manner.
7. The charged-particle beam device according to claim 1 , wherein
said image formation unit forms a plurality of images on the basis of charged particles, said charged particles being obtained by performing a periodic one-dimensional scanning with said beam.
8. The charged-particle beam device according to claim 1 , further comprising:
a signal analysis unit which applies a frequency analysis to waveform information indicating edge of said two-dimensional image; and
a deflector control unit which controls said deflector so that a noise component detected by said signal analysis unit is eliminated.
9. The charged-particle beam device according to claim 1 , further comprising:
a signal analysis unit which applies a frequency analysis to waveform information indicating edge of said two-dimensional image, wherein
said image formation unit forms said image after eliminating a noise component detected by said signal analysis unit.