Dissolved nitrogen concentration monitoring method, substrate cleaning method, and substrate cleaning apparatus
View Patent ↗A dissolved nitrogen concentration monitoring method is used for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped. The method includes measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by ultrasonic wave irradiation. A dissolved nitrogen concentration of the cleaning liquid is calculated from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between a dissolved nitrogen concentration and an amount of increase of dissolved oxygen concentration.
1. A dissolved nitrogen concentration monitoring method for monitoring a dissolved nitrogen concentration of a cleaning liquid when an ultrasonic wave is irradiated onto the cleaning liquid in which a substrate is dipped, the method comprising:
measuring an amount of increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by said irradiated ultrasonic wave; and
calculating a dissolved nitrogen concentration of the cleaning liquid from the measured amount of increase of dissolved oxygen concentration based on a predetermined relationship between the dissolved nitrogen concentration and the amount of increase of dissolved oxygen concentration.
2. The dissolved nitrogen concentration monitoring method according to claim 1 , wherein:
the amount of increase of dissolved oxygen concentration is measured by a dissolved oxygen concentration meter.
3. The dissolved nitrogen concentration monitoring method according to claim 1 , wherein:
dissolved gas information indicating the relationship between the dissolved nitrogen concentration and the amount of increase of dissolved oxygen concentration is compiled in advance for each of a plurality of cleaning conditions of the substrate.
4. The dissolved nitrogen concentration monitoring method according to claim 1 , wherein:
the cleaning liquid is water.
5. The dissolved nitrogen concentration monitoring method according to claim 3 , wherein:
the plurality of cleaning conditions of the substrate includes an ultrasonic output power level.
6. The dissolved nitrogen concentration monitoring method according to claim 3 , wherein:
the cleaning conditions of the substrate includes an overflow rate of the cleaning liquid.
7. The dissolved nitrogen concentration monitoring method according to claim 5 , wherein:
dissolved gas information indicating the relationship between the dissolved nitrogen concentration and the amount of increase of dissolved oxygen concentration indicates that as the ultrasonic output power level increases, the amount of increase of dissolved oxygen concentration corresponding to a specific dissolved nitrogen concentration increases.
8. The dissolved nitrogen concentration monitoring method according to claim 6 , wherein:
dissolved gas information indicating the relationship between the dissolved nitrogen concentration and the amount of increase of dissolved oxygen concentration indicates that as the overflow rate decreases, a rate of change in the amount of increase of dissolved oxygen concentration increases with respect to the dissolved nitrogen concentration.
9. A method for cleaning a substrate by irradiating an ultrasonic wave onto a cleaning liquid disposed in a cleaning bath in which the substrate is dipped, the method comprising:
introducing a cleaning liquid into the cleaning bath, the cleaning liquid including a mixture ratio of a first liquid and a second liquid, the first liquid comprising dissolved nitrogen gas;
determining a measured amount of an increase of a dissolved oxygen concentration of the cleaning liquid resulting from an oxygen molecule generated from a water molecule as a result of a radical reaction caused by said irradiated ultrasonic wave; and
adjusting the mixture ratio of the cleaning liquid with the dissolved nitrogen gas being introduced into the cleaning bath so as to achieve a target amount of increase of the dissolved oxygen concentration in a specific range.