IP Library Granted Patent US 9,222,890
Granted Patent B2
US 9,222,890 · App. 14/000,610 · Granted Dec 29, 2015

Plasma spectrometer

Inventors: Yoshinobu Kohara (Tokyo, JP); Yuzuru Takamura (Nomi, JP)
Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
G01N21/67G01N21/69G01J3/02G01N2201/08
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Quick Facts
Patent No.
US 9,222,890
App. No.
14/000,610
Granted
Dec 29, 2015
Kind
B2
Abstract

To improve detection sensitivity, detection accuracy, and reproducibility when electric discharge is caused in a sample solution to perform analysis with light emission in the plasma, a flow channel 101 provided with a narrow part is filled with a conductive sample solution, plasma is generated in bubbles formed by applying an electric field to the flow channel, and a region other than the narrow part in the flow channel is set as a measurement object region to measure light emission.

Claims (14)

1. A plasma spectrometer comprising:

a flow channel which has a narrow part in the middle and is supplied with a sample solution;

a pair of electrodes which are disposed with the narrow part interposed therebetween to apply a voltage to the flow channel; and

a measuring part which disperses and measures plasma emission which is caused in bubbles formed in the flow channel due to the voltage application,

wherein the measuring part is focused to receive light from a region other than the narrow part of the flow channel as a measurement object region.

2. The plasma spectrometer according to claim 1 , wherein a center of the measurement object region is separated from a center of the narrow part by a distance 1 time or greater a dimension of the narrow part in a flow channel direction.

3. The plasma spectrometer according to claim 1 , wherein the measurement object region is a region between the narrow part and a positive electrode of the pair of electrodes.

4. The plasma spectrometer according to claim 1 , wherein the measurement object region includes the vicinity of an air-liquid interface on a positive electrode side of the pair of electrodes.

5. The plasma spectrometer according to claim 1 , wherein the measurement object region is a region between the narrow part and a negative electrode of the pair of electrodes.

6. The plasma spectrometer according to claim 1 , wherein the measurement object region includes the vicinity of an air-liquid interface on a negative electrode side of the pair of electrodes.

7. The plasma spectrometer according to claim 1 ,

wherein one or more specific times of light emission after second light emission are measured among a plurality of times of plasma emission which are caused with a single voltage application to the flow channel.

8. The plasma spectrometer according to claim 7 , wherein the second light emission is measured among the plurality of times of plasma emission.

9. The plasma spectrometer according to claim 8 , wherein the second light emission is measured for a first half of an emission time of the second light emission.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 21, 2013
From: KOHARA, YOSHINOBU; TAKAMURA, YUZURU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 031059/0693 →
Priority Claims (1)
JP 2011-049041 · Mar 7, 2011 · national
Continuity (1)
Related Publication 20130321803A1 · Dec 5, 2013