IP Library Granted Patent US 9,615,425
Granted Patent B2
US 9,615,425 · App. 14/007,107 · Granted Apr 4, 2017

Metal-based particle assembly

Inventor: Tomohiro Fukuura (Tsukuba, JP)
Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
H05B33/24B22F1/0018B22F1/0096B82Y20/00G02B5/008H01L51/5262B82Y30/00C08G2261/3142C08G2261/3223C08G2261/3246C08G2261/3422C08G2261/95H01L51/5203Y10T428/12153Y10T428/24975Y10T428/256
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Quick Facts
Patent No.
US 9,615,425
App. No.
14/007,107
Granted
Apr 4, 2017
Kind
B2
Abstract

There is provided a metal-based particle assembly comprising 30 or more metal-based particles separated from each other and disposed in two dimensions, the metal-based particles having an average particle diameter in a range of from 200 to 1600 nm, an average height in a range of from 55 to 500 nm, and an aspect ratio, as defined by a ratio of the average particle diameter to the average height, in a range of from 1 to 8, wherein the metal-based particles are disposed such that an average distance between adjacent metal-based particles may be in a range of from 1 to 150 nm. This metal-based particle assembly presents significantly intense plasmon resonance and also allows plasmon resonance to have an effect over a range extended to a significantly large distance.

Claims (8)

1. A metal-based particle assembly film-layered substrate comprising: a substrate; and a film composed of a metal-based particle assembly layered on said substrate, the metal-based particle assembly comprising 17500 or more metal-based particles separated from each other and disposed in two dimensions, said metal-based particles having an average particle diameter in a range of from 200 to 1600 nm, an average height in a range of from 55 to 500 nm, and an aspect ratio, as defined by a ratio of said average particle diameter to said average height, in a range of from 1 to 8, wherein

said metal-based particles are disposed such that an average distance between adjacent metal-based particles is in a range of from 1 to 150 nm, and wherein

the metal-based particle assembly film-layered substrate having in an absorption spectrum for a visible light region a maximum wavelength of a peak at a longest side in wavelength, the maximum wavelength being in a range of from 350 to 550 nm, and the substrate is formed of at least one material selected from the group consisting of an inorganic insulating material selected from SiO 2 and ZrO 2 and a plastic material.

2. The metal-based particle assembly film-layered substrate according to claim 1 , wherein said metal-based particles are oblate particles with said aspect ratio of more than one.

3. The metal-based particle assembly film-layered substrate according to claim 1 , wherein said metal-based particles are made of silver.

4. The metal-based particle assembly film-layered substrate according to claim 1 , wherein said metal-based particles are non-conductive with adjacent metal-based particles.

5. The metal-based particle assembly film-layered substrate according to claim 1 , wherein the absorbance at the maximum wavelength being at least one.

6. The metal-based particle assembly film-layered substrate according to claim 1 , further comprising an insulating layer covering a surface of each metal-based particle that composes said film.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 24, 2013
From: FUKUURA, TOMOHIRO
To: SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 031270/0752 →
Priority Claims (3)
JP 2011-079474 · Mar 31, 2011 · national
JP 2011-245335 · Nov 9, 2011 · national
JP 2012-018645 · Jan 31, 2012 · national
Continuity (1)
Related Publication 20140037977A1 · Feb 6, 2014