Photomask, photomask set, exposure apparatus and exposure method
There is provided a photomask capable of improving alignment accuracy with respective photomasks disposed on the front and rear faces of a substrate. A photomask has a drawing pattern for exposure formed on one face opposing a substrate, a first alignment mark for alignment with a substrate side mark formed on the substrate, the first alignment mark being provided in a region of the one face, the region opposing the substrate when the substrate is retained and the drawing pattern is not formed in the region, and a second alignment mark for alignment with a third alignment mark provided on another photomask, the second alignment mark being provided in a region which does not oppose the substrate when the substrate is retained.
1. A photomask for use with another photomask and a flexible printed substrate having a photosensitive resist layer being provided on both front and rear faces of the flexible printed substrate, the photomask comprising:
a drawing pattern for exposure formed on one face opposing the flexible printed substrate;
a first alignment mark for alignment with a substrate side mark formed on the flexible printed substrate, the first alignment mark being provided in a region of the one face, the region opposing the flexible printed substrate when the flexible printed substrate is retained and the drawing pattern is not formed in the region; and
a second alignment mark for alignment with a third alignment mark provided on the another photomask opposing the other face of the flexible printed substrate, the second alignment mark being provided in a region which does not oppose the flexible printed substrate when the flexible printed substrate is retained.
2. The photomask according to claim 1 , wherein
a recessed portion is provided in the one face, and when negative pressure is applied via a pressure generating means, the recessed portion applies the negative pressure to an opposing face of the flexible printed substrate which opposes the one face.
3. The photomask according to claim 2 , wherein
the recessed portion is provided with a suction trench extending along the one face and a suction hole penetrating to the suction trench from another face on an opposite side of the one face.
4. The photomask according to claim 3 , wherein
the suction trench is formed in a ring shape, the first alignment mark is provided on an inside surrounded by the ring-shaped suction trench on the one face, and the second alignment mark is provided on an outside of the ring-shaped suction trench on the one face.
5. A photomask set a flexible printed substrate having a photosensitive resist layer being provided on both front and rear faces of the flexible printed substrate, the photomask pair comprising:
a first photomask; and
a second photomask, wherein
the first photomask comprises:
a drawing pattern for exposure formed on one face opposing the flexible printed substrate;
a first alignment mark for alignment with a substrate side mark formed on the flexible printed substrate, the first alignment mark being provided in a region of the one face, the region opposing the flexible printed substrate when the flexible printed substrate is retained and the drawing pattern is not formed in the region; and
a second alignment mark for alignment with a third alignment mark provided on the second photomask, the second alignment mark being provided in a region which does not oppose the flexible printed substrate when the flexible printed substrate is retained, and
the second photomask comprises:
a drawing pattern for exposure formed on one face opposing the flexible printed substrate; and
the third alignment mark for alignment with the second alignment mark provided on the first photomask, the third alignment mark being provided in a region of the one face wherein the region does not oppose the flexible printed substrate when the flexible printed substrate is retained.