IP Library Granted Patent US 8,859,190
Granted Patent B1
US 8,859,190 · App. 14/018,058 · Granted Oct 14, 2014

Method to create gradient index in a polymer

Inventors: Shawn M. Dirk (Albuquerque, NM); Ross Stefan Johnson (Wilmington, DE); Robert Boye (Albuquerque, NM); Michael R. Descour (Albuquerque, NM); William C. Sweatt (Albuquerque, NM); David R. Wheeler (Albuquerque, NM); Bryan James Kaehr (Albuquerque, NM)
Assignee: Sandia Corporation
G03F7/20
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Quick Facts
Patent No.
US 8,859,190
App. No.
14/018,058
Granted
Oct 14, 2014
Kind
B1
Abstract

Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of Δn≧1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures.

Claims (21)

1. A method to create a gradient index in a polymer, comprising:

providing a low-index non-conjugated precursor polymer having a photocleavable leaving group; and

photoexposing the precursor polymer to eliminate the photocleavable leaving group, thereby providing a conjugated polymer having a higher index-of-refraction than the precursor polymer, wherein the non-conjugated precursor polymer is exposed to different doses of photons in different regions to create a graded index material.

2. The method of claim 1 , wherein the non-conjugated precursor polymer comprises a precursor to poly(phenylene vinylene).

3. The method of claim 1 , wherein the non-conjugated precursor polymer comprises a precursor to polyacetylene, poly(p-phenylene), poly(thiophene vinylene), poly(pyrrole vinylene), poly(1,4-naphthylene vinylene), poly(p-pyridine vinylene), or a substituted version thereof.

4. The method of claim 1 , wherein the photocleavable leaving group comprises a xanthate.

5. The method of claim 1 , wherein the photocleavable leaving group comprises an acetate, dithiocarbamate, sulfinyl, sulfonium, or halogen.

6. The method of claim 1 , wherein the precursor polymer further comprises at least one alkoxysilane end group to enable crosslinking of the precursor polymer.

7. The method of claim 1 , wherein the photoexposing comprises photopatterning.

8. The method of claim 7 , wherein the photopatterning is accomplished using contact lithography.

9. The method of claim 7 , wherein the photopatterning is accomplished using multiphoton lithography.

10. A method to create a gradient index in a polymer, comprising:

providing a low-index non-conjugated precursor polymer comprising a thermally activated leaving group; and

locally heating the precursor polymer to eliminate the leaving group, thereby providing a conjugated polymer having a higher index-of-refraction than the precursor polymer, wherein the non-conjugated precursor polymer is exposed to different amounts of local heating in different regions to create a graded index material.

11. The method of claim 10 , wherein the non-conjugated precursor polymer comprises a precursor to poly(phenylene vinylene).

12. The method of claim 10 , wherein the non-conjugated precursor polymer comprises a precursor to polyacetylene, poly(p-phenylene), poly(thiophene vinylene), poly(pyrrole vinylene), poly(1,4-naphthylene vinylene), poly(p-pyridine vinylene), or a substituted version thereof.

13. The method of claim 10 , wherein the thermally activated leaving group comprises a xanthate.

14. The method of claim 10 , wherein the thermally activated leaving group comprises an acetate, dithiocarbamate, sulfinyl, sulfonium, or halogen.

15. The method of claim 10 , wherein the precursor polymer further comprises at least one alkoxysilane end group to enable crosslinking of the precursor polymer.

16. The method of claim 10 , wherein the locally heating is accomplished using an atomic force microscope.

17. The method of claim 10 , wherein the locally heating is achieved by exposure to photons.

Assignments (3)
CHANGE OF NAME Recorded May 22, 2018
From: SANDIA CORPORATION
To: NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SANDIA, LLC
Reel/Frame 046207/0342 →
CONFIRMATORY LICENSE Recorded Jun 16, 2015
From: SANDIA CORPORATION
To: U.S. DEPARTMENT OF ENERGY
Reel/Frame 035845/0329 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2015
From: DIRK, SHAWN M.; BOYE, ROBERT; DESCOUR, MICHAEL R.; SWEATT, WILLIAM C.; WHEELER, DAVID R.; KAEHR, BRYAN JAMES; JOHNSON, ROSS S.
To: SANDIA CORPORATION
Reel/Frame 034889/0128 →
Continuity (1)
Provisional Application 61697164 · Sep 5, 2012