IP Library Granted Patent US 8,895,950
Granted Patent B2
US 8,895,950 · App. 14/020,095 · Granted Nov 25, 2014

Methods for passivating a carbonic nanolayer

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Quick Facts
Patent No.
US 8,895,950
App. No.
14/020,095
Granted
Nov 25, 2014
Kind
B2
Abstract

Methods for passivating a carbonic nanolayer (that is, material layers comprised of low dimensional carbon structures with delocalized electrons such as carbon nanotubes and nanoscopic graphene flecks) to prevent or otherwise limit the encroachment of another material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous carbonic nanolayer to fill in the voids within the porous carbonic nanolayer while one or more other material layers are applied over or alongside the carbonic nanolayer. Once the other material layers are in place, the sacrificial material is removed. In other embodiments, a non-sacrificial filler material (selected and deposited in such a way as to not impair the switching function of the carbonic nanolayer) is used to form a barrier layer within a carbonic nanolayer. In other embodiments, carbon structures are combined with and nanoscopic particles to limit the porosity of a carbonic nanolayer.

Claims (28)

1. A carbonic nanolayer based device, comprising:

a carbonic nanolayer comprising a plurality of carbon structures, said carbonic nanolayer having a first side and a second side;

a material layer;

wherein said carbonic nanolayer and said material layer have longitudinal axes that are substantially parallel;

wherein at least a portion of said carbonic nanolayer is ordered to increase the density of carbon structures within at least said portion of said carbonic nanolayer; and

wherein said increased density within said portion of said carbonic nanolayer is selected such as to limit the encroachment of said material layer into said carbonic nanolayer.

2. The carbonic nanolayer based device of claim 1 wherein said carbonic nanolayer is comprised of a first sub-layer and a second sub-layer, the density of said first sub-layer being selected such as to limit the encroachment of said material layer into said second sub-layer.

3. The carbonic nanolayer based device of claim 1 wherein said carbon structures are carbon nanotubes.

4. The carbonic nanolayer based device of claim 3 wherein the density of said carbonic nanolayer is further increased by limiting the length of said carbon nanotubes.

5. The carbonic nanolayer based device of claim 4 wherein the length of said carbon nanotubes is less than about 500 nm.

6. The carbonic nanolayer based device of claim 3 wherein at least a portion of said carbon nanotubes are rafted.

7. The carbonic nanolayer based device of claim 1 wherein said carbonic nanolayer is formed via one of a spin coating process, a spray coating process, or a dip coating process.

8. The carbonic nanolayer based device of claim 1 wherein said carbon structures are selected from the group consisting of single wall carbon nanotubes, multi-wall carbon nanotubes, functionalized carbon nanotubes, oxidized carbon nanotubes, buckyballs, graphene sheets, nano-scopic graphene flecks, and graphene oxide.

9. The carbonic nanolayer based device of claim 1 wherein said material layer is in direct physical contact with said carbonic nanolayer.

10. The carbonic nanolayer based device of claim 1 wherein said material layer and said carbonic nanolayer are in different planes.

11. A nanotube switching device, comprising:

a first conductive element;

a second conductive element;

a nanotube fabric layer comprising a plurality of individual nanotube elements, said nanotube fabric layer having a first side and a second side;

wherein said first side of said nanotube fabric layer is electrical coupled to said first conductive element and said second side of said nanotube fabric layer is electrically coupled to said second conductive element;

wherein at least a portion of said nanotube fabric layer is ordered to increase the density of individual nanotube elements within at least said portion of said nanotube fabric layer; and

wherein said increased density within at least said portion of said nanotube fabric layer is selected such as to limit the encroachment of at least one of said first conductive element and said second conductive element into said nanotube fabric layer.

12. The nanotube switching device of claim 11 wherein the density of said nanotube fabric layer is further increased by limiting the length of said individual nanotube elements.

13. The nanotube switching device of claim 12 wherein the length of said individual nanotube elements is limited to about 0.4 μm.

14. The nanotube switching device of claim 11 wherein said nanotube fabric layer is deposited via a spin coating process.

15. The nanotube switching device of claim 11 wherein said nanotube fabric layer is deposited via a dip coating process.

16. The nanotube switching device of claim 11 wherein said nanotube fabric layer is deposited in such a way that at least a portion said plurality of individual nanotube elements are rafted.

17. The nanotube switching device of claim 11 wherein at least one of said first conductive element and said second conductive element is flexible.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 8, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056789/0932 →
RELEASE OF SECURITY INTEREST IN PATENTS Recorded Jul 8, 2021
From: SILICON VALLEY BANK
To: NANTERO, INC.
Reel/Frame 056790/0001 →
CONFIRMATORY LICENSE Recorded Apr 23, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056032/0549 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT Recorded Nov 11, 2020
From: NANTERO, INC.
To: SILICON VALLEY BANK
Reel/Frame 054383/0632 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 21, 2014
From: RUECKES, THOMAS; MANNING, H. MONTGOMERY; SEN, RAHUL
To: NANTERO INC.
Reel/Frame 032498/0140 →