IP Library › Granted Patent US 8,673,763
Granted Patent B2
US 8,673,763 · App. 14/027,210 · Granted Mar 18, 2014

Stacked digital/RF system-on-chip with integral isolation layer

Inventor: Neil David Feldman (Moreshet, IL)
Assignee: Siano Mobile Silicon Ltd.
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Quick Facts
Patent No.
US 8,673,763
App. No.
14/027,210
Granted
Mar 18, 2014
Kind
B2
Abstract

An apparatus includes a device package, a first Integrated Circuit (IC) that is packaged in the device package, and a second IC, which is packaged in the device package and is fabricated on a multi-layer interconnection circuit including a plurality of interconnection layers for interconnecting components of the second IC, wherein a selected layer in the plurality is configured to serve as a conductive shield for reducing interference between the first and second ICs.

Claims (8)

1. A method for fabricating a System-on-Chip (SoC), the method comprising:

packaging a first Integrated Circuit (IC) in a device package; and

packaging in the device package a second IC, which is fabricated on a multi-layer substrate comprising a plurality of interconnection layers for interconnecting components of the second IC, wherein a selected interconnection layer inside the multi-layer substrate is configured to serve as a conductive shield for reducing interference between the first and second ICs.

2. The method according to claim 1 , wherein the selected interconnection layer is not used for interconnecting any of the components.

3. The method according to claim 1 , wherein one of the first and second ICs comprises a digital IC, and wherein the other of the first and second ICs comprises a Radio Frequency IC (RFIC).

4. The method according to claim 1 , wherein packaging the first and second ICs comprises stacking the first and second ICs on top of the other in the device package.

5. The method according to claim 1 , wherein the interconnection layers, including the selected interconnection layer, are formed jointly in a single fabrication process of the multi-layer substrate.

6. The method according to claim 5 , wherein the single fabrication process comprises a copper interconnect process.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 28, 2024
From: SHENZHEN XIN SINUO TECHNOLOGY PARTNERSHIP (LIMITED PARTNERSHIP)
To: XIN SINUO (NANJING) TECHNOLOGY CO., LTD.
Reel/Frame 069267/0374 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2022
From: CHI-JIA TECHNOLOGY CO., LTD.
To: SHENZHEN XIN SINUO TECHNOLOGY PARTNERSHIP (LIMITED PARTNERSHIP)
Reel/Frame 061784/0783 →
COURT ORDER Recorded May 2, 2017
From: SIANO MOBILE SILICON LTD.
To: CHI-JIA TECHNOLOGY CO., LTD.
Reel/Frame 042389/0153 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2013
From: FELDMAN, NEIL
To: SIANO MOBILE SILICON LTD.
Reel/Frame 031208/0093 →
Continuity (2)
Division 13014729 · Jan 27, 2011
Related Publication 20140017853A1 · Jan 16, 2014