IP Library Granted Patent US 9,508,735
Granted Patent B2
US 9,508,735 · App. 14/031,509 · Granted Nov 29, 2016

Methods and apparatuses having strings of memory cells and select gates with double gates

Inventor: Koji Sakui (Setagayaku, JP)
Assignee: Micron Technology, Inc.
H01L27/11582G11C16/0483G11C16/26G11C16/3427H01L27/1157H01L27/11524H01L27/11556
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Quick Facts
Patent No.
US 9,508,735
App. No.
14/031,509
Granted
Nov 29, 2016
Kind
B2
Abstract

An apparatus, a method, and a system are disclosed. The apparatus includes a string of memory cells coupled to a select gate drain transistor that has a front control gate and a back control gate. The front and back control gates can be coupled together such that they are biased at the same voltage or separate such that they can be biased at different voltages.

Claims (28)

1. An apparatus comprising:

a string of memory cells; and

a select gate drain transistor coupled to the string of memory cells, the select gate drain transistor having a plurality of control gates, wherein the select gate drain transistor is a surround gate transistor, and

wherein the plurality of control gates comprise a front control gate and a back control gate such that the front control gate surrounds a portion of a pillar and the back control gate comprises material over the pillar and a back control gate extension extending into the pillar.

2. The apparatus of claim 1 wherein the plurality of control gates are coupled together.

3. The apparatus of claim 1 wherein the plurality of control gates are not coupled together.

4. The apparatus of claim 1 and further comprising a surround gate select gate source transistor coupled between the string of memory cells and a source.

5. The apparatus of claim 1 wherein the select gate drain transistor is coupled to a data line.

6. An apparatus comprising:

a string of memory cells;

a select gate source transistor coupled between the string of memory cells and a source; and

a select gate drain transistor coupled between the string of memory cells and a data line, the select gate drain transistor comprising a front control gate and a back control gate, wherein the select gate drain transistor comprises a surround gate transistor such that the front control gate surrounds a portion of a pillar and the back control gate comprises a back control gate material extending over the pillar and a back control gate extension extending into the pillar.

7. The apparatus of claim 6 wherein the select gate drain transistor further comprises a dielectric between the extension and the pillar.

8. The apparatus of claim 7 wherein the front control gate and the back control gate each comprise a polysilicon material.

9. The apparatus of claim 6 wherein the pillar comprises polysilicon.

10. A system comprising:

a controller; and

a memory device coupled to the controller, the memory device comprising:

a plurality of strings of memory cells, each string of the plurality of strings comprising a plurality of memory cells coupled to a select gate drain transistor having a pair of control gates comprising a front control gate and a back control gate, wherein the select gate drain transistor comprises:

a polysilicon pillar;

the front gate substantially encircling the pillar;

the back gate having an extension extending into and substantially encircled by the pillar; and

a drain material over the pillar and substantially encircling the back gate extension.

11. The system of claim 10 wherein the pair of control gates are coupled together.

12. The system of claim 10 wherein the pair of control gates is configured to control access of the plurality of memory cells to a data line.

13. The system of claim 10 , wherein the back control gates of each of the plurality of strings of memory cells are coupled together.

14. The system of claim 10 further comprising dielectric material between the front gate and the pillar, between the back gate extension and the pillar, and between the back gate extension and the drain material.

15. The system of claim 10 wherein a body of the select gate drain transistor comprises one of a polysilicon body or a bulk silicon body.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 17, 2014
From: SAKUI, KOJI
To: MICRON TECHNOLOGY, INC.
Reel/Frame 032697/0561 →
Continuity (1)
Related Publication 20150078089A1 · Mar 19, 2015