IP Library › Granted Patent US 9,435,025
Granted Patent B2
US 9,435,025 · App. 14/036,754 · Granted Sep 6, 2016

Gas apparatus, systems, and methods for chamber ports

Inventors: Nagendra V. Madiwal (Bangalore, IN); Robert Irwin Decottignies (Redwood City, CA); Andrew Nguyen (San Jose, CA); Paul B. Reuter (Austin, TX); Angela R. Sico (Round Rock, TX); Michael Kuchar (Georgetown, TX); Travis Morey (Austin, TX); Mitchell Disanto (Georgetown, TX)
Assignee: Applied Materials, Inc.
C23C14/566C23C14/564C23C16/4401H01L21/6719H01L21/67126Y10T29/49432
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Quick Facts
Patent No.
US 9,435,025
App. No.
14/036,754
Granted
Sep 6, 2016
Kind
B2
Abstract

An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.

Claims (11)

1. A chamber port assembly of an electronic device manufacturing system, comprising:

a lid having a gas inlet formed therein and a first gas passageway extending there through, the first gas passageway in fluid communication with the gas inlet;

a gas conduit member having a second gas passageway extending there through, the second gas passageway in fluid communication with the first gas passageway;

a frame insert having a third gas passageway in fluid communication with the second gas passageway; and

one or more gas nozzles coupled to the frame insert and in fluid communication with the third gas passageway, the one or more gas nozzles configured to direct a flow of gas received at the gas inlet into a substrate transfer area, the substrate transfer area configured to receive a substrate as the substrate is transferred through the chamber port assembly from a first chamber to a second chamber.

2. The chamber port assembly of claim 1 , further comprising a second gas conduit member having a fourth gas passageway extending there through, the fourth gas passageway in fluid communication with the first and third gas passageways.

3. The chamber port assembly of claim 1 , further comprising a second gas conduit member having a fourth gas passageway extending there through, the fourth gas passageway in fluid communication with the first gas passageway, wherein the frame insert has a fifth gas passageway in communication with the fourth gas passageway and some of the one or more gas nozzles.

4. The chamber port assembly of claim 1 , further comprising a slit valve mechanism that includes a door, the door having a closed position that abuts the frame insert and seals an opening to the substrate transfer area.

5. The chamber port assembly of claim 1 , wherein the lid is butted against the gas conduit member.

6. The chamber port assembly of claim 1 , wherein the gas conduit member is attached to the frame insert with bolts or screws.

7. The chamber port assembly of claim 1 , wherein the gas conduit member is disposed between the lid and the frame insert.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 6, 2013
From: MADIWAL, NAGENDRA V.; DECOTTIGNIES, ROBERT IRWIN; NGUYEN, ANDREW; REUTER, PAUL B.; SICO, ANGELA R.; KUCHAR, MICHAEL; MOREY, TRAVIS; DISANTO, MITCHELL
To: APPLIED MATERIALS, INC.
Reel/Frame 031353/0342 →
Continuity (1)
Related Publication 20150083330A1 · Mar 26, 2015