IP Library Granted Patent US 9,587,136
Granted Patent B2
US 9,587,136 · App. 14/048,766 · Granted Mar 7, 2017

Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography

Inventors: Padma Gopalan (Madison, WI); Daniel Patrick Sweat (Madison, WI); Xiang Yu (Skokie, IL); Myungwoong Kim (Madison, WI)
Assignee: Wisconsin Alumni Research Foundation
C09D153/00C08F12/22C08F12/32C08F297/02G03F7/0002Y10T428/268
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Quick Facts
Patent No.
US 9,587,136
App. No.
14/048,766
Granted
Mar 7, 2017
Kind
B2
Abstract

Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.

Claims (31)

1. A block copolymer comprising a first polymer block comprising polymerized hydroxystyrene and a second polymer block, the block copolymer having a Flory-Huggins interaction parameter of at least 0.15, wherein the polymer of the second polymer block is characterized in that it will degrade in a hydrochloric acid solution having a hydrochloric acid concentration that is sufficiently high to deprotect poly(4-tert-butoxystyrene) and convert it into poly(4-hydroxystyrene).

2. The block copolymer of claim 1 , having a Flory-Huggins interaction parameter of at least 1.

3. The block copolymer of claim 1 , wherein the polymer of the second polymer block has a Hildebrand solubility parameter of no greater than (16 J/cm 3 ) 1/2 ).

4. The block copolymer of claim 1 , wherein the second polymer block is polydimethylsiloxane.

5. The block copolymer of claim 1 , wherein the second polymer block comprises a substituted polystyrene.

6. The block copolymer of claim 1 , wherein the polymer of the second polymer block comprises a methacrylate polymer.

7. The block copolymer of claim 6 , wherein the methacrylate polymer is poly(isopropyl methacrylate).

8. A polymer film comprising the block copolymer of claim 1 self-assembled into a plurality of domains, wherein the domains have at least one spatial dimension that is no greater than 20 nm.

9. The block copolymer of claim 1 , wherein the mass ratio of the hydroxystyrene polymer block to the second polymer block is in the range from 20:1 to 1:1.

10. The polymer film of claim 8 , wherein the hydroxystyrene is 3-hydroxystyrene or 2-hydroxystyrene.

11. The polymer film of claim 10 having a Flory-Huggins interaction parameter of at least 1.

12. The polymer film of claim 10 , wherein the second polymer block is polydimethylsiloxane.

13. The polymer film of claim 10 , wherein the second polymer block comprises a substituted polystyrene.

14. The polymer film of claim 10 , wherein the polymer of the second polymer block comprises a methacrylate polymer.

15. A block copolymer comprising a first polymer block comprising polymerized hydroxystyrene and a second polymer block selected from poly(3,5-di t-butyl substituted styrene) and poly(4-trimethylsilylstyrene, the block copolymer having a Flory-Huggins interaction parameter of at least 0.15.

16. A block copolymer comprising a first polymer block comprising polymerized hydroxystyrene and a second polymer block comprising poly(methacrylisobutyl polyhedral oligomeric silsesquioxane), the block copolymer having a Flory-Huggins interaction parameter of at least 0.15.

17. A block copolymer comprising a first polymer block comprising polymerized hydroxystyrene and a second polymer block comprising poly(4-t-butylcyclohexyl methacrylate) or poly(4-t-butyl phenyl methacrylate).

18. A block copolymer comprising a first polymer block comprising polymerized 3-hydroxystyrene and a second polymer block, the block copolymer having a Flory-Huggins interaction parameter of at least 0.15.

19. The block copolymer of claim 18 , wherein the second polymer block is polyisoprene.

20. The block copolymer of claim 18 having a Flory-Huggins interaction parameter of at least 1.

21. The block copolymer of claim 18 , wherein the second polymer block is polydimethylsiloxane.

22. The block copolymer of claim 18 , wherein the second polymer block comprises a substituted polystyrene.

23. The block copolymer of claim 18 , wherein the polymer of the second polymer block comprises a methacrylate polymer.

24. The block copolymer of claim 18 , wherein the polymer of the second polymer block has a Hildebrand solubility parameter of no greater than 16 (J/cm 3 ) 1/2 .

25. A block copolymer comprising a first polymer block comprising polymerized 2-hydroxystyrene and a second polymer block, the block copolymer having a Flory-Huggins interaction parameter of at least 0.15.

26. The block copolymer of claim 25 having a Flory-Huggins interaction parameter of at least 1.

27. The block copolymer of claim 25 , wherein the second polymer block is polydimethylsiloxane.

28. The block copolymer of claim 25 , wherein the second polymer block comprises a substituted polystyrene.

29. The block copolymer of claim 25 , wherein the second polymer block is polyisoprene.

30. The block copolymer of claim 25 , wherein the polymer of the second polymer block comprises a methacrylate polymer.

31. The block copolymer of claim 25 , wherein the polymer of the second polymer block has a Hildebrand solubility parameter of no greater than 16 (J/cm 3 ) 1/2 .

Assignments (2)
CONFIRMATORY LICENSE Recorded Jul 31, 2014
From: WISCONSIN ALUMNI RESEARCH FOUNDATION
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 033451/0817 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2013
From: GOPALAN, PADMA; SWEAT, DANIEL; KIM, MYUNGWOONG; YU, XIANG
To: WISCONSIN ALUMNI RESEARCH FOUNDATION
Reel/Frame 031727/0868 →
Continuity (1)
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