Schottky diode
View Patent ↗A Schottky diode has: a semiconductor layer stack including a GaN layer formed over a substrate and an AlGaN layer formed on the GaN layer and having a wider bandgap than the GaN layer; an anode electrode and a cathode electrode which are formed at an interval therebetween on the semiconductor layer stack; and a block layer formed in a region between the anode electrode and the cathode electrode so as to contact the AlGaN layer. A part of the anode electrode is formed on the block layer so as not to contact the surface of the AlGaN layer. The barrier height between the anode electrode and the block layer is greater than that between the anode electrode and the AlGaN layer.
1. A Schottky diode, comprising:
a substrate;
a semiconductor layer stack including a first nitride semiconductor layer formed over the substrate and a second nitride semiconductor layer formed on the first nitride semiconductor layer and having a wider bandgap than the first nitride semiconductor layer;
an anode electrode and a cathode electrode which are formed at an interval therebetween on the semiconductor layer stack; and
a block layer formed in a region between the anode electrode and the cathode electrode so as to contact the second nitride semiconductor layer, wherein:
a channel is formed at an interface between the first nitride semiconductor and the second nitride semiconductor,
the anode electrode forms a Schottky contact with the channel,
the cathode electrode forms an ohmic contact with the channel,
a part of the anode electrode is formed on the block layer so as not to contact an upper surface of the second nitride semiconductor layer, and
a potential barrier height between the anode electrode and the block layer is greater than a potential barrier height between the anode electrode and the second nitride semiconductor layer.
2. The Schottky diode of claim 1 , wherein
the semiconductor layer stack includes multiple first nitride semiconductor layers and multiple second nitride semiconductor layers, and
the first nitride semiconductor layers and the second nitride semiconductor layers are alternately stacked.
3. The Schottky diode of claim 1 , wherein
the semiconductor layer stack has a stepped portion formed by removing a part of the second nitride semiconductor layer so as to expose the first nitride semiconductor layer, and
the anode electrode is formed so as to cover the stepped portion and to contact the block layer.
4. The Schottky diode of claim 1 , wherein
the block layer is comprised of an insulating material.
5. The Schottky diode of claim 1 , wherein
the block layer is comprised of a semiconductor.