Wafer arrangement, a method for testing a wafer, and a method for processing a wafer
According to various embodiments, a wafer arrangement may be provided, the wafer arrangement may include: a wafer including at least one electronic component having at least one electronic contact exposed on a surface of the wafer; an adhesive layer structure disposed over the surface of the wafer, the adhesive layer structure covering the at least one electronic contact; and a carrier adhered to the wafer via the adhesive layer structure, wherein the carrier may include a contact structure at a surface of the carrier aligned with the at least one electronic contact so that by pressing the wafer in direction of the carrier, the contact structure can be brought into electrical contact with the at least one electronic contact of the at least one electronic component.
1. A wafer arrangement, comprising:
a wafer comprising at least one electronic component having at least one electronic contact exposed on a surface of the wafer;
an adhesive layer structure disposed over the surface of the wafer, the adhesive layer structure covering the at least one electronic contact; wherein the adhesive layer structure comprises an electrically insulating glue; and
a carrier adhered to the wafer via the adhesive layer structure, wherein the carrier comprises a contact structure at a surface of the carrier aligned with the at least one electronic contact; wherein the at least one electronic component is resiliently structurally-biased in an insulated position and is configured to be selectively displaced into a contacted position and is further configured to revert to the insulated position after being selectively displaced.
2. The wafer arrangement according to claim 1 ,
wherein the contact structure comprises one or more contacts protruding from the surface of the carrier.
3. The wafer arrangement according to claim 1 ,
wherein the contact structure is partially embedded in the carrier.
4. The wafer arrangement according to claim 1 ,
wherein the contact structure comprises one or more holes extending through the carrier from the surface of the carrier to another surface of the carrier opposite to the surface of the carrier, wherein the one or more holes are filled with an electrically conductive material.
5. The wafer arrangement according to claim 4 ,
wherein the one or more holes are filled with at least one material of a group of materials consisting of: tungsten; titanium; titanium nitride; tantalum; and steel.
6. The wafer arrangement according to claim 1 ,
wherein the contact structure comprises a wiring structure embedded in the carrier;
wherein the wiring structure comprises an electrically conductive material.
7. The wafer arrangement according to claim 6 ,
wherein the wiring structure comprises a first wiring and a second wiring;
wherein the first wiring is electrically isolated from the second wiring.
8. The wafer arrangement according to claim 7 ,
wherein the contact structure comprises a first set of contacts and a second set of contacts respectively protruding from the surface of the carrier, wherein the first set of contacts is electrically coupled to the first wiring and the second set of contacts is electrically coupled to the second wiring.
9. A method for testing a wafer, the method comprising:
providing a wafer arrangement, the wafer arrangement comprising:
a wafer comprising at least one electronic component having at least one electronic contact exposed on a surface of the wafer;
an adhesive layer structure disposed over the surface of the wafer, the adhesive layer structure covering the at least one electronic contact;
wherein the adhesive layer structure comprises an electrically insulating glue;
a carrier adhered to the wafer via the adhesive layer structure, wherein the carrier comprises a contact structure at a surface of the carrier aligned with the at least one electronic contact; wherein the at least one electronic component is resiliently structurally-biased in an insulated position and is configured to be selectively displaced into a contacted position;
displacing the selected at least one electronic component into the contacted position, wherein the selected at least one electronic component reverts to the insulated position after the displacing the selected at least one electronic component into the contacted position; and
performing an electrical test of the at least one electronic component via a testing device electrically coupled to the contact structure of the carrier during the displacing the selected at least one electronic component into the contacted position.
10. A wafer arrangement, comprising:
a wafer comprising at least one electronic component having at least one electronic contact exposed on a surface of the wafer;
an adhesive layer structure disposed over the surface of the wafer, the adhesive layer structure covering the at least one electronic contact wherein the adhesive layer structure comprises an electrically insulating glue; and
a carrier adhered to the wafer via the adhesive layer structure, wherein the carrier comprises a contact structure at a surface of the carrier aligned with the at least one electronic contact wherein the at least one electronic component is resiliently structurally-biased in an insulated position and is configured to be selectively displaced into a contacted position, wherein the contacted position contacts the at least one electronic contact with the contact structure; and
wherein the adhesive layer structure is resiliently displaced in the contacted position and reverts position after the at least one electronic component is selectively displaced.
11. The wafer arrangement according to claim 1 ,
wherein the adhesive layer structure is elastic.