Thermal processing apparatus and thermal processing method for heating substrate by light irradiation
A susceptor that holds a semiconductor wafer placed thereon is capable of moving up and down inside a chamber. For preheating with a halogen lamp, the susceptor moves to a preheating position. The preheating position is a height of the susceptor that achieves the most uniform in-plane illumination distribution of light emitted from the halogen lamp and applied to the semiconductor wafer. After the preheating is finished, the susceptor moves to a flash heating position for irradiation with a flash from a flash lamp. The flash heating position is a height of the susceptor that achieves the most uniform in-plane illumination distribution of a flash emitted from the flash lamp and applied to the semiconductor wafer.
1. A thermal processing apparatus for heating a substrate by irradiating the substrate with light, comprising:
a chamber that houses a substrate;
a susceptor that holds the substrate placed thereon inside said chamber;
a halogen lamp that preheats the substrate held on said susceptor to a given preheating temperature by irradiating one surface of the substrate with light;
a flash lamp that irradiates an opposite surface of the preheated substrate with a flash;
an up-and-down driving unit that moves said susceptor up and down and thereby adjusts the distance between said susceptor and said halogen lamp and the distance between said susceptor and said flash lamp;
an up-and-down controller that controls said up-and-down driving unit to move said susceptor holding the substrate to a first position for preheating with said halogen lamp and to move said susceptor to a second position farther away from said halogen lamp than said first position for irradiation with a flash from said flash lamp; and further comprising a tilting mechanism that tilts said susceptor relative to a horizontal plane.
2. A thermal processing apparatus for heating a substrate by irradiating the substrate with light, comprising:
a chamber that houses a substrate;
a susceptor that holds the substrate placed thereon inside said chamber;
a halogen lamp that preheats the substrate held on said susceptor to a given preheating temperature by irradiating one surface of the substrate with light;
a flash lamp that irradiates an opposite surface of the preheated substrate with a flash;
an up-and-down driving unit that moves said susceptor up and down and thereby adjusts the distance between said susceptor and said halogen lamp and the distance between said susceptor and said flash lamp;
an up-and-down controller that controls said up-and-down driving unit to move said susceptor holding the substrate to a first position for preheating with said halogen lamp and to move said susceptor to a second position farther away from said halogen lamp than said first position for irradiation with a flash from said flash lamp; and
further comprising a buffering mechanism that absorbs an impact on said susceptor.
3. A thermal processing method for heating a substrate by irradiating the substrate with light, comprising the steps of:
(a) moving a susceptor holding a substrate placed thereon up and down inside a chamber to adjust the distance between said susceptor and the halogen lamp and move said susceptor to a first position;
(b) preheating the substrate held on said susceptor to a given preheating temperature by irradiating one surface of the substrate with light emitted from a halogen lamp;
(c) moving said susceptor up and down to a second position farther away from said halogen lamp than said first position, the step (c) being performed after said step (b);
(d) irradiating an opposite surface of the preheated substrate with a flash emitted from a flash lamp; and
wherein in said step (b), said susceptor is tilted relative to a horizontal plane.