Facile Large Area Periodic Sub-Micron Photolithography
Disclosed herein are articles and methods useful for the lithographic applications. The articles comprise a wrinkling structure and a photosensitive material. The articles and methods provide low cost alternatives to conventional lithographic applications. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.
1 . An article comprising a wrinkling structure and a film of photosensitive material, wherein the wrinkling structure comprises a soft substrate and a first material, wherein the wrinkling structure has a first side and a second side, wherein at least a portion of the first side of the wrinkling structure contact at least a portion of the film of the photosensitive material.
2 . The article of claim 1 , wherein the first material comprises the first side of the wrinkling structure.
3 . The article of claim 1 , wherein the film of the photosensitive material has a first and second side, wherein the first side of the wrinkling structure is in contact with at least a portion of the first side of the film of the photosensitive material, and wherein at least a portion of the second side of the film of the photosensitive material is in contact with an etchable substrate.
4 . The article of claim 1 , wherein the first material is a film on the soft substrate.
5 . The article of claim 4 , wherein the film of the first material is less than 100 nm thick.
6 . The article of claim 1 , wherein the soft substrate is an elastomer.
7 . The article of claim 1 , wherein the soft substrate comprises a polymer.
8 . The article of claim 7 , wherein the polymer comprises polydimethylsiloxane (PDMS).
9 . The article of claim 1 , wherein the first material comprises gold, palladium, silver, copper, chrome, titanium, tungsten, aluminum, silica, indium tin oxide, or a combination thereof
10 . The article of claim 1 , wherein the first material comprises gold/palladium, silica, or a combination thereof
11 . The article of claim 1 , wherein the wrinkling structure has a sinusoidal pattern.
12 . The method of claim 11 , wherein the sinusoidal pattern has a periodicity of less than 10 μm.
13 . A method comprising
a) providing article comprising a wrinkling structure and a film photosensitive material, wherein the wrinkling structure comprises a soft substrate and a first material, wherein the wrinkling structure has a first side and a second side, wherein the film photosensitive material has a first and second side, wherein at least a portion of the first side of the wrinkling structure contact at least a portion of the first side of the film of the photosensitive material;
b) irradiating second side of the wrinkling structure, thereby causing a chemical reaction in at least a portion of the photosensitive material.
14 . The method of claim 13 , wherein at least a portion of the second side of the film of the photosensitive material is in contact with an etchable material.
15 . The method of claim 13 , wherein the first material comprises the first side of the wrinkling structure.
16 . The method of claim 13 , wherein the chemical reaction in the photosensitive material changes the solubility of at least a portion of the photosensitive material.
17 . The method of claim 13 , wherein the irradiating is performed with a UV lamp, a light emitting diode, or mercury lamp.
18 . The method of claim 13 , wherein the method further comprises removing a portion of the photosensitive material.
19 . The method of claim 19 , wherein the method further comprises subjecting the article to an etch process, thereby etching the etchable material.
20 . An article comprising the photosensitive material contacting the etchable substrate produced by the method of claim 18 .