Contact structure and formation thereof
A semiconductor device and methods of formation are provided. A semiconductor device includes an annealed cobalt plug over a silicide in a first opening of the semiconductor device, wherein the annealed cobalt plug has a repaired lattice structure. The annealed cobalt plug is formed by annealing a cobalt plug at a first temperature for a first duration, while exposing the cobalt plug to a first gas. The repaired lattice structure of the annealed cobalt plug is more regular or homogenized as compared to a cobalt plug that is not so annealed, such that the annealed cobalt plug has a relatively increased conductivity or reduced resistivity.
1. A method of forming a semiconductor device comprising:
lining an opening with metal;
performing a first annealing operation to form a silicide from the metal;
lining the opening with a glue layer that contacts a top surface of the silicide;
forming a cobalt plug in the opening over the silicide and over the glue layer; and
performing a second annealing operation on the cobalt plug at a first temperature for a first duration while exposing the cobalt plug to a first gas to form an annealed cobalt plug.
2. The method of claim 1 , the forming the cobalt plug comprising forming a cobalt lining in the opening before forming a cobalt fill over the cobalt lining.
3. The method of claim 1 , the forming the cobalt plug comprising forming the cobalt plug at a first pressure between about 0.5 Torr to about 760 Torr.
4. The method of claim 1 , the first gas comprising at least one of Ar, H 2 , N 2 , He or NH 3 .
5. The method of claim 1 , the first temperature between about 200° C. to about 800° C.
6. The method of claim 1 , the first duration between about 10 s to about 600 s.
7. The method of claim 1 , the performing a second annealing operation comprising introducing the first gas into a chamber at a first flow rate between 1 sccm to about 1000 sccm.
8. The method of claim 1 , the forming the cobalt plug comprising forming the cobalt plug using chemical vapor deposition (CVD).
9. The method of claim 1 , the forming the cobalt plug comprising forming the cobalt plug using a cobalt precursor.
10. The method of claim 9 , the cobalt precursor comprising at least one of:
cyclopentadienyl cobalt dicarbonyl (CpCo(CO) 2 ),
Dicobalt hexacarbonyl tert-butylacetylene (CCTBA: C 12 H 10 O 6 (Co) 2 ),
bis(cyclopentadienyl)cobalt (Co(C 5 H 5 ) 2 , CpCo(CO) 2 ),
bis(ethylcyclopentadienyl)cobalt (C 14 H 18 Co),
bis(ethylcyclopentadienyl)cobalt (C 14 H 18 Co),
bis(pentamethylcyclopentadienyl)cobalt (C 20 H 30 Co), or
Cobalt tris(2,2,6,6-tetramethyl-3,5-heptanedionate) (CO(OCC(CH 3 ) 3 CHCOC(CH 3 ) 3 ) 3 ).
11. The method of claim 1 , the performing a second annealing operation comprising annealing the cobalt plug to repair a lattice structure of the cobalt plug such that the annealed cobalt plug has a repaired lattice structure.
12. A semiconductor device comprising:
a silicide;
a dielectric layer;
a metal layer in contact with a sidewall of the dielectric layer and in contact with a top surface of the silicide;
a second dielectric layer in contact with the metal layer;
a glue layer in contact with the second dielectric layer; and
an annealed cobalt plug over the silicide, the annealed cobalt plug comprising a repaired lattice structure, the second dielectric layer and the glue layer between the metal layer and the annealed cobalt plug.
13. The semiconductor device of claim 12 , the second dielectric layer in contact with the to surface of the silicide.
14. The semiconductor device of claim 12 , the glue layer in contact with the to surface of the silicide.
15. The semiconductor device of claim 12 , wherein a width of the silicide is greater than a width of the annealed cobalt plug.
16. A method of forming a semiconductor device comprising:
lining an opening with metal, the opening at least partially defined by a dielectric;
performing a first annealing operation to form a silicide from the metal;
forming a second dielectric in the opening after forming the silicide;
etching the second dielectric to form a second opening over the silicide;
forming a cobalt plug in the second opening over the silicide; and
performing a second annealing operation on the cobalt plug at a first temperature while exposing the cobalt plug to a first gas to form an annealed cobalt plug.
17. The method of claim 16 , the forming the cobalt plug comprising forming the cobalt plug at a first pressure between about 0.5 Torr to about 760 Torr.
18. The method of claim 16 , the forming the cobalt plug comprising forming the cobalt plug using a cobalt precursor.
19. The method of claim 16 , the forming the cobalt plug comprising forming the cobalt plug using chemical vapor deposition (CVD).
20. The method of claim 16 , the opening having a first width and the second opening having a second width less than the first width.