PLASMA ANTENNA AND APPARATUS FOR GENERATING PLASMA HAVING THE SAME
Provided are a plasma antenna and a plasma generating apparatus including the same. The plasma antenna includes a first antenna inducing electromagnetic fields by using an RF signal, a second antenna inducing electromagnetic fields by using the RF signal, and a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.
1 . A plasma antenna comprising:
a first antenna inducing electromagnetic fields by using an RF signal;
a second antenna inducing electromagnetic fields by using the RF signal; and
a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.
2 . The plasma antenna of claim 1 , wherein the first antenna comprises a first RF feed receiving the RF signal and having a pillar shape and a first coil connected to the first RF feed, and
the second antenna comprises a second RF feed receiving the RF signal and having a hollow pillar shape surrounding the first RF feed and a second coil connected to the second RF feed.
3 . The plasma antenna of claim 2 , wherein the capacitor is constituted by the first RF feed, the second RF feed, and a dielectric disposed between the first RF feed and the second RF feed.
4 . The plasma antenna of claim 2 , wherein the first RF feed has a cylindrical shape, and
the second RF feed has a hollow cylindrical shape surrounding the cylindrical shape.
5 . The plasma antenna of claim 2 , wherein the first and second RF feeds are coaxially disposed with respect to each other.
6 . The plasma antenna of claim 3 , wherein the dielectric comprises a polymer or metal oxide.
7 . The plasma antenna of claim 6 , wherein the polymer comprises Teflon, ULTEM, or polyetheretherketone (PEEK).
8 . The plasma antenna of claim 6 , wherein the metal oxide comprises ceramic.
9 . The plasma antenna of claim 8 , wherein the ceramic comprises Al 2 O 3 or ZnO.
10 . The plasma antenna of claim 2 , wherein the plasma antenna comprises a plurality of capacitors along a longitudinal axis of each of the first and second RF feeds.
11 . The plasma antenna of claim 10 , wherein the plurality of capacitors are constituted by the first RF feed, the second RF feed, and a plurality of dielectrics disposed between the first and second RF feeds.
12 . The plasma antenna of claim 11 , wherein the plurality of dielectrics are spaced a predetermined distance from each other along the longitudinal axis.
13 . The plasma antenna of claim 11 , wherein the plurality of dielectrics are different in material.
14 . The plasma antenna of claim 2 , wherein the capacitor comprises:
a first conductor having a pillar shape, the first conductor being coaxially disposed with respect to the first RF feed;
a second conductor has a hollow pillar shape surrounding the first conductor, the second conductor being coaxially disposed with respect to the second RF feed.
15 . The plasma antenna of claim 14 , wherein the capacitor is attachable to at least one of the first and second antennas.
16 . A plasma generating apparatus comprising:
an RF power source providing an RF signal;
a plasma chamber in which a gas is injected to generate plasma; and
a plasma antenna disposed on the plasma chamber, the plasma receiving the RF signal to induce electromagnetic fields in the plasma chamber,
wherein the plasma antenna comprises:
a first antenna inducing electromagnetic fields by using the RF signal;
a second antenna inducing electromagnetic fields by using the RF signal; and
a capacitor connected between an input terminal of the first antenna and an input terminal of the second antenna.
17 . The plasma generating apparatus of claim 16 , wherein the plasma antenna is disposed on an upper portion of the plasma chamber.
18 . The plasma generating apparatus of claim 16 , wherein the first and second antennas are inductively coupled to each other.
19 . The plasma generating apparatus of claim 16 , wherein the first and second antennas are connected to each other in parallel.
20 . The plasma generating apparatus of claim 16 , wherein the first antenna comprises a first RF feed receiving the RF signal and having a pillar shape and a first coil connected to the first RF feed, and
the second antenna comprises a second RF feed receiving the RF signal and having a hollow pillar shape surrounding the first RF feed and a second coil connected to the second RF feed.
21 . The plasma generating apparatus of claim 20 , wherein the capacitor is constituted by the first RF feed, the second RF feed, and a dielectric disposed between the first RF feed and the second RF feed.
22 . The plasma generating apparatus of claim 21 , wherein the dielectric comprises a polymer or metal oxide.
23 . The plasma generating apparatus of claim 22 , wherein the polymer comprises Teflon, ULTEM, or polyetheretherketone (PEEK).
24 . The plasma generating apparatus of claim 22 , wherein the metal oxide comprises ceramic.
25 . The plasma generating apparatus of claim 24 , wherein the ceramic comprises Al 2 O 3 or ZnO.
26 . The plasma generating apparatus of claim 20 , wherein the capacitor comprises:
a first conductor having a pillar shape, the first conductor being coaxially disposed with respect to the first RF feed;
a second conductor has a hollow pillar shape surrounding the first conductor, the second conductor being coaxially disposed with respect to the second RF feed.
27 . The plasma generating apparatus of claim 26 , wherein the capacitor is attachable to at least one of the first and second antennas.