IP Library Granted Patent US 8,933,399
Granted Patent B2
US 8,933,399 · App. 14/123,310 · Granted Jan 13, 2015

Mass spectrometry device including self-cleaning unit

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Quick Facts
Patent No.
US 8,933,399
App. No.
14/123,310
Granted
Jan 13, 2015
Kind
B2
Abstract

When a specimen from a specimen ionizing unit is not sufficiently ionized, is caused to remain in sites other than a pore in an introducing section and be deposited as a product such as an oxide or carbide, which causes a deterioration in the performance of the mass spectrometry device. The mass spectrometry device has a specimen ionizing section for ionizing a specimen, a specimen-introduction regulating chamber into which ions of the ionized specimen are introduced, a differential evacuation chamber located downstream of the specimen-introduction regulating chamber, and an analyzing section located at the downstream side of the differential evacuation chamber, in which a discharge generating means is formed for generating an electric discharge inside the specimen-introduction regulating chamber and/or the differential evacuation chamber. The discharge generating means has a specimen introducing section electrode and a first-pore-section-forming member located oppositely to each other inside the specimen-introduction regulating chamber.

Claims (18)

1. A mass spectrometry device, comprising a specimen supply source, a specimen ionizing section for ionizing a specimen supplied from the specimen supply source, a specimen-introduction regulating chamber into which ions of the ionized specimen are introduced, a differential evacuation chamber located at the downstream side of the specimen-introduction regulating chamber, and an analyzing section located at the downstream side of the differential evacuation chamber,

the device further comprising a discharge generating means for generating an electric discharge inside at least one of the specimen-introduction regulating chamber and the differential evacuation chamber,

wherein the discharge generating means uses a high-frequency.

2. The mass spectrometry device according to claim 1 ,

wherein the discharge generating means has a specimen introducing section electrode and a first-pore-section-forming member, which is an electrode, located oppositely to each other inside the specimen-introduction regulating chamber, or a first-pore-section-forming member, which is an electrode, and a second-pore-section-forming member, which is an electrode, located oppositely to each other inside the differential evacuation chamber.

3. The mass spectrometry device according to claim 2 ,

further comprising an atmospheric pressure vessel for covering the specimen introducing section electrode, the specimen ionizing section, and the specimen supply source.

4. The mass spectrometry device according to claim 2 ,

further comprising a vacuum pressure vessel for covering the specimen introducing section electrode, the first-pore-section-forming member, which is an electrode, the second-pore-section-forming member, which is an electrode, and the differential evacuation chamber.

5. The mass spectrometry device according to claim 1 ,

wherein the electric discharge is continued while a gas or washing liquid for promoting the decomposition of a deposit is introduced.

6. The mass spectrometry device according to claim 1 ,

further comprising a detecting means for detecting an end point of cleaning by the electric discharge using the high-frequency,

wherein the detecting means detects an end point of cleaning by verifying a mass spectrum of a specific deposit.

7. The mass spectrometry device according to claim 6 ,

wherein the detecting means for detecting the end point of cleaning comprises a self-cleaning unit including an optical unit such as a spectroscope or a plasma monitor.

8. The mass spectrometry device according to claim 6 ,

wherein the detecting means for detecting the end point of cleaning comprises a self-cleaning unit including a pressure meter.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 26, 2013
From: SAMPEI, MAKOTO
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 031848/0090 →