Phase plate and electron microscope
View Patent ↗Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings ( 23 ) connected into a single opening, and multiple electrodes ( 11 ) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes ( 11 ) are configured such that a voltage application layer ( 24 ) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes ( 11 ), and of ameliorating the problem of anisotropic potential distributions.
1. A phase plate used for an electron microscope, comprising:
openings connected into a single opening; and
multiple electrodes arranged in the single opening, each of the multiple electrodes extending from an outer portion of the single opening toward a center of the single opening,
wherein the multiple electrodes have voltage application layers covered by shield layers via insulators,
wherein the voltage application layers and the shield layers are each composed of a conductor or a semiconductor,
wherein sidewalls of the outer portion of the single opening are covered by the shield layers, and
wherein the multiple electrodes have the voltage application layers exposed at respective inner sidewalls facing the center of the single opening.
2. The phase plate according to claim 1 , wherein the multiple electrodes are provided in a rotational symmetric arrangement with respect to the center of the opening.
3. The phase plate according to claim 1 , wherein the voltage application layers of the multiple electrodes are electrically independent.
4. The phase plate according to claim 3 , wherein each of the multiple electrodes has a plurality of the voltage application layers inside, each of which is composed of the conductor or the semiconductor.
5. The phase plate according to claim 1 , wherein other sidewalls of the multiple electrodes are covered by the shield layers, the other sidewalls extending from the outer portion of the single opening to the inner sidewalls.
6. The phase plate according to claim 1 , wherein each of the multiple electrodes has a width which is reduced from the outer portion of the opening towards the center of the opening.
7. The phase plate according to claim 1 , wherein each of the multiple electrodes has a shape which forms a curve from the outer portion of the opening towards the center of the opening.
8. A phase plate used for an electron microscope, comprising:
an opening; and
multiple electrodes arranged in the opening, each of the multiple electrodes extending from an outer portion of the opening toward a center of the opening, wherein:
the multiple electrodes have voltage application layers covered by shield layers via insulators;
the voltage application layers and the shield layers are each composed of a conductor or a semiconductor;
a number of the multiple electrodes in the opening is an odd number; and
the voltage application layers of the multiple electrodes are electrically independent from one another.
9. The phase plate according to claim 8 , wherein first sidewalls of the multiple electrodes are covered by the shield layers, the first sidewalls extending from the outer portion of the opening to inner sidewalls that face the center of the opening.
10. The phase plate according to claim 8 , wherein:
sidewalls of the outer portion of the opening are covered by the shield layer; and
the multiple electrodes have the voltage application layers exposed at respective inner sidewalls that face the center of the opening.
11. An electron microscope for observing a sample using an electron beam, comprising:
a source of the electron beam;
an irradiation optical system for irradiating the sample with the electron beam emitted from the source;
a lens system for forming an image of the sample;
a phase plate which applies a phase difference to the electron beam from the sample;
a control unit for controlling the electron microscope; and
a display device connected to the control unit for displaying an observation image of the sample, wherein:
the phase plate includes openings connected into a single opening, and multiple electrodes arranged in the single opening, each of the multiple electrodes extending from an outer portion of the single opening toward a center of the single opening;
the multiple electrodes have voltage application layers covered by shield layers via insulators;
the voltage application layers and the shield layers are each composed of a conductor or a semiconductor,
sidewalls of the outer portion of the single opening are covered by the shield layers, and
wherein the multiple electrodes have the voltage application layers exposed at respective inner sidewalls facing the center of the single opening.
12. The electron microscope according to claim 11 , further comprising a micro moving mechanism controlled by the control unit to enable micro movement of a position of the phase plate.
13. The electron microscope according to claim 11 , wherein:
the voltage application layers of the multiple electrodes of the phase plate are electrically independent; and
the control unit is capable of independently controlling a magnitude of a voltage applied to the multiple electrodes.
14. The electron microscope according to claim 13 , wherein the display device displays a control screen for controlling the magnitude of the voltage to be applied to the multiple electrodes.
15. The electron microscope according to claim 14 , wherein the display device displays a diffractgram as the observation image of the sample, and is capable of adjusting the magnitude of the voltage applied to the multiple electrodes on the control screen based on the diffractgram.
16. The electron microscope according to claim 11 , wherein other sidewalls of the multiple electrodes of the phase plate are covered by the shield layers, the other sidewalls extending from the outer portion of the single opening to the inner sidewalls.
17. An electron microscope for observing a sample using an electron beam, comprising:
a source of the electron beam;
an irradiation optical system for irradiating the sample with the electron beam emitted from the source;
a lens system for forming an image of the sample;
a phase plate which applies a phase difference to the electron beam from the sample;
a control unit for controlling the electron microscope; and
a display device connected to the control unit for displaying an observation image of the sample,
wherein the phase plate includes an opening and multiple electrodes arranged in the opening, each of the multiple electrodes extending from an outer portion of the opening toward a center of the opening,
the multiple electrodes have voltage application layers covered by shield layers via insulators,
the voltage application layers and the shield layers are each composed of a conductor or a semiconductor, and
a number of the multiple electrodes in the opening is an odd number.
18. The electron microscope according to claim 17 , wherein first sidewalls of the multiple electrodes are covered by the shield layers, the first sidewalls extending from the outer portion of the opening to inner sidewalls that face the center of the opening.
19. The electron microscope according to claim 17 , wherein:
sidewalls of the outer portion of the opening are covered by the shield layers; and
the multiple electrodes have the voltage application layers exposed at respective inner sidewalls that face the center of the opening.