Amorphous layer extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor
An integrated extreme ultraviolet blank production system includes: a vacuum chamber for placing a substrate in a vacuum; a deposition system for depositing a multi-layer stack without removing the substrate from the vacuum; and a treatment system for treating a layer on the multi-layer stack to be deposited as an amorphous metallic layer. A physical vapor deposition chamber for manufacturing an extreme ultraviolet mask blank includes: a target, comprising molybdenum alloyed with boron. An extreme ultraviolet lithography system includes: an extreme ultraviolet light source; a mirror for directing light from the extreme ultraviolet light source; a reticle stage for placing an extreme ultraviolet mask blank with a multi-layer stack having an amorphous metallic layer; and a wafer stage for placing a wafer. An extreme ultraviolet blank includes: a substrate; a multi-layer stack having an amorphous metallic layer; and capping layers over the multi-layer stack.
1. An extreme ultraviolet blank comprising:
a substrate;
a multi-layer stack having an amorphous metallic layer over the substrate, the multi-layer stack reflective of extreme ultraviolet light;
a capping layer over the multi-layer stack; and
an absorber layer which absorbs extreme ultraviolet light, the absorber layer over the capping layer.
2. The blank as claimed in claim 1 wherein the amorphous metallic layer is an alloyed amorphous metallic layer.
3. The blank as claimed in claim 1 wherein the amorphous metallic layer is alloyed with boron, nitrogen, or carbon.
4. The blank as claimed in claim 1 wherein the amorphous metallic layer is amorphous molybdenum.
5. The blank as claimed in claim 1 wherein the amorphous metallic layer has a disrupted crystalline structure.
6. The blank as claimed in claim 1 wherein the amorphous metallic layer has suppressed grain growth.
7. The blank as claimed in claim 1 wherein the multi-layer stack forms an extreme ultraviolet mask blank.
8. The blank as claimed in claim 1 wherein the multi-layer stack forms an extreme ultraviolet mirror.
9. The blank as claimed in claim 1 wherein the substrate is an ultra-low thermal expansion material.
10. The blank as claimed in claim 1 wherein the substrate is a glass.
11. The blank as claimed in claim 1 , wherein the multi-layer stack comprises alternating layers of molybdenum and silicon.
12. The blank as claimed in claim 11 , further comprising an antireflective coating over the absorber layer.
13. The blank as claimed in claim 11 , wherein the capping layer comprises ruthenium and the absorber layer comprises tantalum.
14. The blank as claimed in claim 13 , wherein the amorphous metallic layer is an alloyed amorphous metallic layer.
15. The blank as claimed in claim 13 , wherein the amorphous metallic layer is alloyed with boron, nitrogen, or carbon.
16. The blank as claimed in claim 15 , wherein the amorphous metallic layer is amorphous molybdenum.
17. The blank as claimed in claim 13 , wherein the amorphous metallic layer has a disrupted crystalline structure.
18. The blank as claimed in claim 13 , wherein the amorphous metallic layer has suppressed grain growth.
19. The blank as claimed in claim 13 , wherein the multi-layer stack forms an extreme ultraviolet mask blank.
20. The blank as claimed in claim 13 , wherein the multi-layer stack forms an extreme ultraviolet mirror.
21. The blank as claimed in claim 13 , wherein the substrate is an ultra-low thermal expansion material.
22. The blank as claimed in claim 13 , wherein the substrate is a glass.